Projection optical system and projection exposure apparatus

ABSTRACT

A projection optical system for projecting an image of an object onto an image plane. The projection optical system includes a first imaging optical system for forming an image of the object in which the first imaging optical system includes a first mirror for reflecting and collecting abaxial light from the object, a second imaging optical system for re-imaging the image upon the image plane, a second mirror for reflecting light from the first mirror to the image plane side, whereby the abaxial light is caused to pass outside of an effective diameter of the first mirror, and a field optical system including three lenses each having a positive refractive power. The abaxial light passed through the outside of the effective diameter of the first mirror is refracted by the three lenses toward a direction nearing an optical axis of the three lenses. Light that has passed through the three lenses is directed to the second imaging optical system, and the first and second imaging optical systems are disposed along a common optical axis.

This application is a divisional application of copending U.S. patentapplication Ser. No. 09/784,021, filed Feb. 16, 2001.

FIELD OF THE INVENTION AND RELATED ART

This invention relates to a projection optical system and a projectionexposure apparatus for projecting a pattern of a mask onto a substratethrough the projection optical system. More particularly, the inventionconcerns a catadioptric projection optical system having a reflectionmirror, for printing, by projection exposure, a reticle pattern on asemiconductor wafer.

The density of an integrated circuit increases more and more, and thespecification and performance required for a projection (exposure)optical system become much stricter. Generally, in order to obtain ahigher resolving power, the exposure wavelength is shortened and/or thenumerical aperture (NA) of a projection optical system is enlarged.

However, as the exposure wavelength reaches a region of 193 nm (ArFexcimer laser light) or 157 nm (F₂ excimer laser light), usable lensmaterials are limited to quartz and fluorite. This is mainly because ofdecreases of the light transmission factor. For example, in a projectionoptical system such as disclosed in Japanese Laid-Open PatentApplication, Laid-Open No. 79345/1998, wherein it comprises all dioptriclenses of a large number and wherein all lenses have a large glassmaterial thickness, the exposure amount on a wafer becomes low and itcauses a decrease of the throughput. Also, due to thermal absorption bythe lenses, there occur problems (thermal aberration) such as changes ofaberration or shift of the focal point position. When the exposurewavelength is 193 nm, quartz and fluorite can be used as a projectionoptical system. However, because the difference in dispersion betweenthem is not large, correction of chromatic aberration is difficult toaccomplish. In order to correct the chromatic aberration of a projectionoptical system completely, it is necessary to use a few achromaticlenses having a small curvature radius at its achromatic surface. Thisleads to an increase of the total glass material thickness of theoptical system, which then raises the above-described problems ofthermal aberration and transmission factor. Further, currently, it isvery difficult to produce a projection optical system by use offluorite, having a sufficient property to assure its design performance.It is further difficult to produce one having a large diameter. Thismakes it very difficult to accomplish color correction, and results inan increase of the cost. As for the exposure wavelength of 157 nm, onlyfluorite is the usable lens material. The chromatic aberration cannot becorrected only with a single lens material. Anyway, it is very difficultto provide a projection optical system only by use of dioptric systems.

In consideration of these inconveniences, many proposals have been madeto introduce a reflecting system, having a mirror, into an opticalsystem to thereby avoid the problems of transmission factor and colorcorrection. For example, Japanese Laid-Open Patent Applications,Laid-Open Nos. 211332/1997 and 90602/1998 show a catoptric projectionoptical system which is constituted only by use of reflecting systems.Further, U.S. Pat. No. 5,650,877 and Japanese Laid-Open PatentApplications, Laid-Open Nos 210415/1987, 258414/1987, 163319/1988,66510/1990, 282527/1991, 234722/1992, 188298/1993, 230287/1994, and304705/1996 show a catadioptric projection optical system having acombination of catoptric and dioptric systems.

When a projection optical system which includes a catoptric system tomeet the shortening of the exposure wavelength and the enlargement of NA(numerical aperture) is produced, the structure should of course be onethat enables correction of chromatic aberration. In addition,idealistically, the structure should be simple and sufficient to enablethat an imaging region of sufficient size is defined upon an imageplane, that the number of optical elements such as mirrors or lenses issmall, that the mirror incidence angle and reflection angle are notlarge, and that a sufficient image-side working distance is assured.

If an imaging region width of sufficient size is attainable on the imageplane, in the case of a scan type projection exposure apparatus, it isadvantageous with respect to the throughput, such that the exposurevariation can be suppressed. If the number of optical elements is small,the process load in the production of optical elements such as mirrorsand lenses can be reduced. Also, since the total glass materialthickness can be made smaller, the loss of light quantity can bereduced. Further, the increase of the footprint of the apparatus can besuppressed, and the loss of light quantity due to the film can also bedecreased. Particularly, this is very advantageous because, when theexposure wavelength is 157 nm (F₂ excimer laser light), the loss oflight quantity at the mirror reflection film cannot be disregarded. Whenthe mirror incidence angle and the reflection angle are not large, theinfluence of a change in light quantity due to the angularcharacteristic of the reflection film can be suppressed. If a sufficientimage-side working distance can be maintained, it is advantageous withrespect to structuring an auto focusing system or a wafer stageconveyance system in the apparatus. If the structure is simple,complexity of a mechanical barrel, for example, can be avoided, and itprovides an advantage to the manufacture.

Here, the conventional examples are considered with respect to theabove-described points.

In the projection optical system shown in U.S. Pat. No. 5,650,877, aMangin mirror and a refracting member are disposed in an optical systemto print an image of a reticle on a wafer. This optical system hasinconveniences that, in every picture angle used, there occurs lightinterception (void) at the central portion of a pupil and that theexposure region cannot be made large. If the exposure region is to beenlarged, it disadvantageously causes widening of the light interceptionat the central portion of the pupil. Further, the refractive surface ofthe Mangin mirror defines a beam splitting surface such that the lightquantity decreases to a half each time the light passes this surface.The light quantity will be decreased to about 10% upon the image plane(wafer surface).

In the projection optical systems shown in Japanese Laid-Open PatentApplications, Laid-Open Nos. 211332/1997 and 90602/1998, the basicstructure comprises a reflection system only. However, with respect toaberration (Petzval sum) and mirror disposition, it is difficult to keepa sufficient imaging region width on the image plane. Also, since, inthis structure, a concave mirror adjacent to the image plane and havinga large power mainly has an imaging function, enlargement of NA isdifficult to accomplish. Since a convex mirror is placed just before theconcave mirror, a sufficient image-side working distance cannot bemaintained.

In the projection optical systems shown in Japanese Laid-Open PatentApplications, Laid-Open Nos. 210415/1987 and 258414/1987, a Cassegraintype or Schwarzschild type mirror system is used. An opening is formedat the central portion of the mirror, by which a void is defined in thepupil such that only the peripheral portion of the pupil contributes tothe imaging. However, the presence of a void in the pupil will have aninfluence on the imaging performance. If the pupil void is to be madesmaller, the power of the mirror must be large. This causes enlargementof the incidence and reflection angles of the mirror. Further, anenlarged NA (numerical aperture) will cause a large increase of themirror diameter.

In the projection optical systems shown in Japanese Laid-Open PatentApplications, Laid-Open Nos. 163319/1988, 188298/1993 and 230287/1994,the structure is complicated due to deflection and bend of the opticalpath. Since most of the power of optical groups for imaging anintermediate image, as a final image, is sustained by a concave mirror,it is structurally difficult to enlarge the NA. The magnification of thelens system which is disposed between the concave mirror and the imageplane is at a reduction ratio and also it has a positive sign. Becauseof it, a sufficient image-side working distance cannot be kept. Further,in order that the object plane and the image plane are placed opposed,it is necessary to use two flat mirrors only for the sake of deflectionof the optical path, without any contribution to aberration correction.As the exposure wavelength is shortened to 157 nm, this is undesirablealso with respect to the loss of light quantity. Further, it isstructurally difficult to hold the imaging region width because of thenecessity of light path division. Since the optical system has to belarge, there is a disadvantage with respect to the footprint.

In the projection optical systems shown in Japanese Laid-Open PatentApplications, Laid-Open Nos. 66510/1990 and 282527/1991, the opticalpath is divided by abeam splitter, and this makes the barrel structurecomplicated. It needs a beam splitter of a large diameter and, if thisis of a prism type, the loss of light quantity is large because of itsthickness. For a larger NA, a larger diameter is necessary, and thus theloss of light quantity becomes larger. If the beam splitter is of a flatplate type, there will occur astigmatism and coma even in regard toaxial light rays. Further, there may occur aberrations due to a changein characteristic at the light dividing surface or production ofasymmetric aberration resulting from thermal absorption. It is thereforedifficult to manufacture the beam splitter very accurately.

In the projection optical systems shown in Japanese Laid-Open PatentApplications, Laid-Open Nos. 234722/1992 and 304705/1996, many of theabove-described inconveniences may be removed. However, each time theoptical path is deflected, the light path from a concave mirror isdivided. This requires eccentric optical handling and it makes thestructure and assembling very complicated.

SUMMARY OF THE INVENTION

It is accordingly an object of the present invention to provide aprojection optical system of simple structure and easy assemblingwherein an optical system such as disclosed in Japanese Laid-Open PatentApplications, Laid-Open Nos. 234722/1992 and 304705/1996, describedabove, is improved. It is another object of the present invention toprovide a projection exposure apparatus and/or a device manufacturingmethod using the same.

In accordance with the present invention, a projection optical system, aprojection exposure apparatus and a device manufacturing method havingfeatures as stated in Items (1)–(37) below are provided.

(1) A projection optical system for projecting an image of an objectonto an image plane, comprising: a first imaging optical system forforming an image of the object; a second imaging optical system forre-imaging the image upon the image plane; wherein said first and secondimaging optical systems are disposed in an order from the object sideand are disposed along a common straight optical axis, wherein saidfirst imaging optical system includes a first mirror for reflecting andcollecting abaxial light from the object, wherein one of said first andsecond imaging optical systems includes a second mirror for reflectinglight from said first mirror to the image plane side, and wherein, withsaid second mirror, the abaxial light is caused to pass an outside of aneffective diameter of said first mirror.

(2) A projection optical system according to Item (1) wherein said firstimaging optical system has a magnification β which satisfies a relation|β|≧1.

(3) A projection optical system according to Item (1) or (2) whereinsaid first imaging optical system includes at least one lens.

(4) A projection optical system according to Item (3) wherein said lenshas a positive refracting power.

(5) A projection optical system according to any one of Items (1) to (4)wherein said second imaging optical system includes at least one lens.

(6) A projection optical system according to Item (5) wherein said lenshas a positive refracting power.

(7) A projection optical system according to any one of Items (1) to(6), further comprising a lens group disposed between said first andsecond mirrors.

(8) A projection optical system according to Item (7) wherein said lensgroup has a negative refracting power and wherein said lens group isdisposed between said first mirror and a refractive lens of said firstimaging optical system, having a positive refracting power.

(9) A projection optical system according to Item (1), furthercomprising a field optical system disposed between said first and secondimaging optical systems, for projecting a pupil of said first imagingoptical system onto said second imaging optical system, wherein saidfirst imaging optical system comprises a first mirror group of positiverefracting power, including at least said first mirror, and a secondmirror group including said second mirror, wherein light from said firstmirror group as reflected by said second mirror group is caused to passan outside of an effective diameter of said first mirror group.

(10) A projection optical system according to Item (9) wherein saidsecond imaging optical system is constituted by lenses only and it has apositive refracting power.

(11) A projection optical system according to Item (9) or (10) whereinsaid second imaging optical system has a magnification BG2 whichsatisfies a relation −0.5<BG2<−0.05.

(12) A projection optical system according to any one of Items (9) to(11), wherein said first imaging optical system has a magnification BG1which satisfies a relation −40.0<BG1<−0.5.

(13) A projection optical system according any one of Items (9) to (12),wherein said field optical system is constituted by lenses.

(14) A projection optical system according to any one of Items (9) to(12), wherein said field optical system comprises a first field mirrorand a second field mirror group including a second field mirror, whereinabaxial light passed through the outside of the effective diameter ofsaid first mirror group is reflected by said first field mirror and saidsecond field mirror, in this order, and after that, the light passes aregion adjacent to the optical axis of said first field mirror andenters said second imaging optical system.

(15) A projection optical system according to Item (14) wherein saidfirst field mirror comprises a concave mirror and wherein said secondfield mirror comprises a convex mirror.

(16) A projection optical system according to Item (14) wherein saidfirst field mirror comprises a concave mirror and wherein said secondfield mirror comprises a concave mirror.

(17) A projection optical system according to any one of Items (9) to(16), wherein relations P1<0 and Pf+P2>0 are satisfied where P1, Pf andP2 are Petzval sums of said first imaging optical system, said fieldoptical system and said second imaging optical system, respectively.

(18) A projection optical system according to any one of Items (9) to(17), wherein a relation 0.6<e/LM1<2.5 is satisfied where LM1 is aparaxial distance between the object and said first mirror, and e is adistance from the object to a pupil conjugate point defined by anoptical element positioned at the object side of said first mirror.

(19) A projection optical system according to any one of Items (9) to(18), wherein the distance LM1 satisfies a relation0.5<OIL/(LM1+2×LM2)<20 where LM2 is a paraxial distance between saidfirst and second mirrors, and OIL is a paraxial distance along theoptical path, from the object to the image defined by said first imagingoptical system.

(20) A projection optical system according to any one of Items (9) to(19), wherein the distances LM1 and LM2 satisfy a relation0.2<LM2/LM1<0.95.

(21) A projection optical system according to any one of Items (9) to(20), wherein the distance LM1 satisfies a relation 0.15<LM1/L<0.55where L is a distance from an object plane to an image plane in saidprojection optical system.

(22) A projection optical system according to any one of Items (9) to(21), wherein said first mirror group has a magnification BGM1 whichsatisfies a relation −2.0<1/BGM1<0.4.

(23) A projection optical system according to any one of Items (9) to(22), wherein said first imaging optical system has a lens group ofpositive refracting power, disposed closest to the object side.

(24) A projection optical system according to any one of Items (9) to(23), wherein said first mirror group includes a lens of negativerefracting power and said first mirror.

(25) A projection optical system according to any one of Items (9) to(24), wherein said second mirror group includes said second mirror and alens.

(26) A projection optical system according to any one of Items (9) to(25), wherein the abaxial light from the object passes a lens of saidsecond mirror group before it is incident on said first mirror group.

(27) A projection optical system according to any one of Items (9) to(26), wherein a positive lens, included by said field optical system, isdisposed just after the image plane side of said first mirror group ofsaid first imaging optical system.

(28) A projection optical system according to any one of Items (14) to(16), wherein a relation 0.45<LFM1/LFM2<0.8 is satisfied where LFM1 is adistance between said second field mirror and said first field mirror,and LFM2 is a distance between said second field mirror and the imageplane.

(29) A projection optical system according to any one of Items (14) to(16), wherein said second field mirror group includes said second fieldmirror and a lens.

(30) A projection optical system according to any one of Items (14) to(16), (28) and (29), wherein a positive lens, included by said fieldoptical system, is disposed between said first mirror of said firstimaging optical system and said second field mirror of said fieldoptical system, wherein light reflected by said second mirror of saidfirst imaging optical system passes said positive lens and then isreflected by said first field mirror.

(31) A projection optical system according to any one of Items (1) to(30), wherein said projection optical system is telecentric with respectto each of the object side and the image plane side.

(32) A projection optical system according to any one of Items (1) to(31), wherein said projection optical system has a magnification of areduction ratio.

(33) A projection optical system according to any one of Items (1) to(32), further comprising a field stop disposed at the position of theimage defined by said first imaging optical system, for changing atleast one of a size and a shape of an imaging region upon the imageplane.

(34) A projection optical system according to any one of Items (1) to(33), further comprising a stop disposed inside said second imagingoptical system.

(35) A projection exposure apparatus for projecting a pattern of a maskonto a substrate through a projection optical system as recited in anyone of Items (1) to (34).

(36) A projection exposure apparatus according to Item (35) whereinlaser light from one of an ArF excimer laser and an F₂ laser is used forthe projection exposure.

(37) A device manufacturing method, comprising the steps of: printing adevice pattern on a wafer by exposure, using a projection exposureapparatus as recited in Item (35) or (36); and developing the exposedwafer.

These and other objects, features and advantages of the presentinvention will become more apparent upon a consideration of thefollowing description of the preferred embodiments of the presentinvention taken in conjunction with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic view of an example of the structure of aprojection optical system according to an embodiment of the presentinvention.

FIG. 2 is a schematic view of an example of the structure of aprojection optical system according to a first embodiment of the presentinvention, wherein a refractive lens group R is disposed in a group L2.

FIG. 3 is a schematic view of a basic structure of a projection opticalsystem according to a second embodiment of the present invention.

FIG. 4 is a sectional view of a lens structure in Example 1 of thepresent invention.

FIG. 5 is a sectional view of a lens structure in Example 2 of thepresent invention.

FIG. 6 is a sectional view of a lens structure in Example 3 of thepresent invention.

FIG. 7 is a sectional view of a lens structure in Example 4 of thepresent invention.

FIG. 8 illustrates aberrations in Example 1 of the present invention.

FIG. 9 illustrates aberrations in Example 2 of the present invention.

FIG. 10 illustrates aberrations in Example 3 of the present invention.

FIG. 11 illustrates aberrations in Example 4 of the present invention.

FIG. 12 is a schematic view of a light path in a case, in Example 5 ofthe present invention, wherein a field optical system is constituted bylens systems.

FIG. 13 is a schematic view of a light path in a case, in Example 6 ofthe present invention, wherein a field optical system is constituted bylens systems.

FIG. 14 is a schematic view of a light path in a case, in Example 7 ofthe present invention, wherein a field optical system is constituted bylens systems.

FIG. 15 is a schematic view of a light path in a case, in Example 8 ofthe present invention, wherein a field optical system is constituted bylens systems.

FIG. 16 is a schematic view of a light path in a case, in Example 9 ofthe present invention, wherein a field optical system is constituted bylens systems.

FIG. 17 is a schematic view of a light path in a case, in Example 10 ofthe present invention, wherein a field optical system is constituted bylens systems.

FIG. 18 is a schematic view of a light path in a case, in Example 11 ofthe present invention, wherein a field optical system is constituted bylens systems.

FIG. 19 is a schematic view of a light path in a case, in Example 12 ofthe present invention, wherein a field optical system is constituted bylens systems.

FIG. 20 is a schematic view of a light path in a case, in Example 13 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 21 is a schematic view of a light path in a case, in Example 14 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 22 is a schematic view of a light path in a case, in Example 15 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 23 is a schematic view of a light path in a case, in Example 16 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 24 is a schematic view of a light path in a case, in Example 17 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 25 is a schematic view of a light path in a case, in Example 18 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 26 is a schematic view of a light path in a case, in Example 19 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 27 is a schematic view of a light path in a case, in Example 20 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 28 is a schematic view of a light path in a case, in Example 21 ofthe present invention, wherein a field optical system includes twomirrors.

FIG. 29 illustrates aberrations in Example 5 of the present invention.

FIG. 30 illustrates aberrations in Example 6 of the present invention.

FIG. 31 illustrates aberrations in Example 7 of the present invention.

FIG. 32 illustrates aberrations in Example 8 of the present invention.

FIG. 33 illustrates aberrations in Example 9 of the present invention.

FIG. 34 illustrates aberrations in Example 10 of the present invention.

FIG. 35 illustrates aberrations in Example 11 of the present invention.

FIG. 36 illustrates aberrations in Example 12 of the present invention.

FIG. 37 illustrates aberrations in Example 13 of the present invention.

FIG. 38 illustrates aberrations in Example 14 of the present invention.

FIG. 39 illustrates aberrations in Example 15 of the present invention.

FIG. 40 illustrates aberrations in Example 16 of the present invention.

FIG. 41 illustrates aberrations in Example 17 of the present invention.

FIG. 42 illustrates aberrations in Example 18 of the present invention.

FIG. 43 illustrates aberrations in Example 19 of the present invention.

FIG. 44 illustrates aberrations in Example 20 of the present invention.

FIG. 45 illustrates aberrations in Example 21 of the present invention.

FIG. 46 illustrates numerical parameters in Examples 1–12 of the presentinvention.

FIG. 47 illustrates numerical parameters in Examples 13–21 of thepresent invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

In accordance with an embodiment of the present invention, acatadioptric projection optical system, such as shown in FIG. 1, isprovided (First Embodiment). Denoted at 101 is a reticle which isilluminated with an illumination system, not shown. Denoted at 102 is awafer, and denoted at 103 is an lo optical axis of an optical system inthe first embodiment. Here, the optical system comprises at least firstand second imaging optical systems G1 and G2, in an order from theobject side. The reticle 101 and the wafer 102 are held by movablestages (not shown), respectively.

The first imaging optical system G1 comprises, in an order from theobject side, at least a first mirror M1, having a refracting element L1,and and a second mirror M2. Light from the reticle 101 is imaged by thefirst imaging optical system G1, whereby an intermediate image Io isformed. Here, abaxial light from the reticle 101 passes an outside ofthe effective diameter of the first mirror M1. The intermediate image loas imaged by the first imaging optical system G1 is then imaged on thewafer 102 by the second imaging optical system G2, comprising arefracting element, at a predetermined magnification. In the structuredescribed above, the optical system of the first embodiment has oneoptical axis 103, and it accomplishes a multiple-number imaging opticalsystem wherein abaxial light without light interception of a pupil isimaged.

The first imaging optical system G1 comprises, at least, one or morerefracting lenses and two mirrors. The refractive lens group L1 mainlyfunctions to keep the telecentricity at the object side and contributesto correction of distortion aberration. Also, it serves so that light isincident on the first mirror M1 without excessive expansion.

The second mirror M2 is disposed opposed to the first mirror M1 and theoptical axis 103, and it functions to deflect the light from the firstmirror M1 toward the positive direction and also to direct the lighttoward the outside of the effective diameter of the first mirror M1.Here, the direction from the reticle 101 toward the wafer 102 is takenas a positive direction. With the structure described above, light canbe directed to the second imaging optical system without a void in apupil and without bend of the optical axis.

The refractive lens group L1 should desirably have a positive refractingpower. With the positive refracting power, the incidence height on thefirst mirror M1 can be kept moderate and also the incidence angle on thefirst mirror M1 with respect to the optical axis can be made large suchthat separation of light by the second mirror M2 is made easy. The firstmirror M1 should desirably be a concave mirror.

In the optical system of the first embodiment, the pupil of the firstimaging optical system G1 is present before or after the first mirrorM1. In the portion adjacent there, the width of light at each pictureangle in the first imaging optical system G1 becomes large.Additionally, dispersion of light due to the difference in picture anglebecomes small. Thus, the first mirror M1 as it has a positive power,i.e., as being provided by a concave mirror, is effective to convergelights, of each picture angle, from the refractive lens group L1, suchthat separation of light after the second mirror M2 is made easier.Also, a curvature of field is produced in an “over” direction, therebyto cancel an “under” curvature of field in the second imaging opticalsystem G2.

The second mirror M2 plays a role of returning the light from the firstmirror M1 toward the positive direction along the optical axis 103.Here, the second mirror M2 may be a concave mirror or a flat mirror, ora convex mirror. It should have a required shape based on the differencein power arrangement. It is to be noted that, in the first imagingoptical system G1, for cancellation of the curvature of field of thesecond imaging optical system G2 as well as other aberrations, thesecond mirror M2 may be a concave mirror. This is preferable since therefracting power of the first mirror M1 is shared by it.

The second imaging optical system G2 has a function for imaging theintermediate image Io, being imaged by the first imaging optical systemG1, upon the wafer 102. The second imaging optical system G2 operates tocancel aberrations such as curvature of field in the “over” direction,for example, as produced by the first imaging optical system G1. Thesecond imaging optical system G2 comprises a refractive lens system. Byconstituting a final imaging optical system with use of a refractivelens system, an optical system having a large numerical aperture can beaccomplished easily.

The second imaging optical system has a reduction magnification, andthis prevents an excessive increase of the width of light at the firstimaging optical system G1 as well as it facilitates separation of lightby the first and second mirrors M1 and M2. There is an aperture stopinside the second imaging optical system G2.

The refractive lens group R may be disposed in the group L2, includingtwo mirrors, that is, the first and second mirrors M1 and M2.

FIG. 2 is a schematic view of an example wherein a refractive lens groupR is disposed in the structure of FIG. 1. Here, the same referencenumerals as those of FIG. 1 are assigned to members having correspondingfunctions.

When the refractive lens group R is disposed between the refractive lensgroup L1 and the first mirror M1, the structure is such as called areciprocal optical system. Namely, into this refractive lens group R,the light refracted by the refractive lens group L1 enters and,additionally, the light reflected by the second mirror M2 passestherethrough. When this refractive lens group R is used, the refractingpower thereof should desirably be negative. If the refracting power ofthe refractive lens group R is negative, the Petzval sum which the firstmirror M1 bears is shared. Also, it contributes to correction ofchromatic aberration in the whole system. Thus, if the refractive lensgroup R is provided, it should desirably have a negative refractingpower. Further, simultaneously, it contributes to correction of comaaberration and spherical aberration of the whole system.

As described hereinbefore, mainly for correction of axial chromaticaberration or the like, the refractive lens group R should preferably bedisposed about the first mirror M1. However, it may be disposed adjacentto the second mirror R. Namely, it may be disposed at a position fortransmitting the reflection light from the first mirror M1 and thereflection light from the second mirror. Further, the refractive lensgroup R may be disposed at any place within the range of the group L2,including two mirrors. Also, lens elements of any number may be used.

The projection optical system in this embodiment, particularly when itis provided by a double-imaging optical system, has a positivemagnification.

In the first embodiment, with the structure such as described above, acatadioptric optical system having constituent elements of a smallernumber, having a high resolving power, having an assured wide exposureregion, and being easy for assembling and adjustment, can beaccomplished without light interception at the central portion of apupil.

In accordance with another embodiment of the present invention, acatadioptric projection optical system such as shown in FIG. 3, forexample, is provided (Second Embodiment). In this embodiment, the regionof the object plane from which the light reaches the image plane andwhich is attributable to the imaging is a semi-arcuate zone (ring-likefield) outside the optical axis, and there is no void at the centralportion of the light upon the pupil plane. The projection optical systemcomprises, in an order along the optical path from the object side, afirst imaging system Gr1 having a function for forming an intermediateimage of the object, a field optical system Grf for projecting a pupilof the first imaging system Gr1 onto a pupil of a second imaging systemGr2, and the second imaging system Gr2 is disposed just before the imageplane and operates to form a final image. The first imaging system Gr1includes two mirror groups, i.e., a first mirror group Gm1 including afirst mirror M1 and having a positive refracting power, and a secondmirror group GM2 including a second mirror M2. The second mirror groupGM2 is disposed physically at the object side of the first mirror groupGM1, and the first mirror M1 is a concave mirror having its concavesurface facing to the object side. The light from the object side isreflected by the first and second mirrors M1 and M2, in this order,inside the first imaging system Gr1. After this, the light goes throughthe outside of the effective diameter of the first mirror group GM1toward the image side, and it passes through the field optical systemGrf and the second imaging system Gr2. Thus, the whole system of theprojection optical system is defined along a straight optical axis 103.The object plane and the image plane are opposed to each other, at theopposite ends of the optical axis 103. The magnification of theprojection optical system is a reduction ratio.

FIG. 3 is a schematic view of a basic structure of the secondembodiment, and FIGS. 12–45 show Examples 5–21, respectively, to whichthe second embodiment is applied, to be described later. In allexamples, the first imaging system Gr1 has two mirrors, and the secondimaging system Gr2 comprises refractive lens systems only. FIGS. 12–19show cases wherein the field optical system Grf is provided by lenssystems, and FIGS. 20–28 show cases wherein the field optical system Grfhas two mirrors.

Generally, when a mirror is used, the optical system functions asfollows.

-   -   (a) No chromatic aberration occurs at the mirror.

With this feature, when a concave lens and a concave mirror are combinedto provide a Mangin mirror, even by a positive power, excessivedichromatism can be produced.

-   -   (b) The relation between the power of the mirror and the Petzval        sum is opposite to that of an ordinary refractive lens.

With this feature, since a concave mirror, for example, has a negativevalue of Petzval sum while it has a positive power, the power load of anegative lens in the optical system for correction of Petzval sum can bereduced.

-   -   (c) Light rays are reflected.

Because of this, the optical system has to be complicated to place theobject and image planes opposed to each other. For example, there occursa void in the pupil, ring field, and bend of the optical path.

In this embodiment, to accomplish the above-described purposes, thefunctions of a mirror such as described above are effectively reflectedto the optical system. As shown in FIG. 3, the structure is simple andthe projection optical system is disposed along a straight optical axis103, although it uses a first imaging system, a field optical system, asecond imaging system and a mirror, as shown in FIG. 3. This providessignificant advantages. Since there is no necessity of bending theoptical path, the barrel structure can be made simple like that of aconventional refractive lens system. As regards the self-weightdeformation of an optical element, since the gravity direction and theoptical axis direction are registered with each other, there does notoccur asymmetrical deformation. Thus, an asymmetrical aberration doesnot occur easily. Current equipment for the manufacture, such asperipheral equipment for assembling and adjustment as well asinstruments for measurement, for example, can be used. This is veryadvantageous with respect to the cost. Further, since the footprint ofthe apparatus is substantially the same as that of a conventionalrefractive lens system, the area to be occupied is unchanged. Thisfeature is accomplished by the arrangement that, while an optical systemconcept (ring field system) in which only paraxial light contributes tothe imaging, is set, the function (c) described above is used twice inthe first imaging system Gr1, and double reflections are accomplishedwith the use of two mirrors, and that the light from the object side isdirected through the outside of the effective diameter of the firstmirror group GM1 to the image side. The light thereafter passes throughthe field optical system Grf and the second imaging system Gr2, and itreaches the image plane. Thus, an optical system having a single opticalaxis is accomplished.

The second imaging system Gr2 is provided by a refractive lens system,and it has a positive refracting power. With this structure, enlargementof the NA can be met and, additionally, the image side working distancecan be assured easily. If the second imaging system Gr2 has a concavemirror, as described with reference to the conventional examples, itbecomes difficult to enlarge the NA and to keep the image side workingdistance. The field optical system Grf may be provided by refractivelens systems, as shown at (A) in FIG. 3. Alternatively, it may comprisetwo mirrors, such as shown at (B) in FIG. 3. As will be described laterin relation to the examples, depending on the power arrangement, thepositive lens FL1 may be omitted. In the case of (B) in FIG. 3, thefield optical system Grf includes a first field mirror FM1, comprising aconcave mirror, and a second field mirror FM2, comprising a convexmirror. The second field mirror may be provided by a concave mirror.

As regards the color correction, the achromatic state of the firstimaging system Gr1 may be made “over achromatism” on the basis of thefunction (a) described above, when the first mirror group GM1 isconstituted by a lens LN1 of negative refracting power as well as thefirst mirror M1, which is a concave mirror. Thus, even though a singleglass material is used for the lens, correction of chromatic aberrationcan be attained. This is very advantageous particularly for use of anArF excimer laser or an F₂ excimer laser.

As regards reduction in the number of optical elements or reduction insize and weight, since this embodiment concerns a ring field systemusing abaxial light only, the mirror diameter can be made smaller thanthat of an optical system of a Cassegrain type or Schwarzschild type.Further, the number of mirrors is small in this embodiment, as at leasttwo.

In the first imaging system Gr1, due to the function (b) describedabove, the first mirror group GM1 of the first imaging system Gr1provides a large negative Petzval sum. Thus, the field optical systemGrf and the second imaging system Gr2 can be provided, without usingmany negative refracting power lenses for correction of the Petzval sumas in the conventional refractive lens system. As a result, the numberof lenses can be reduced. Further, where the second mirror group GM2 ofthe first imaging system Gr1 is provided by a lens LP1 and a mirror M2,the power sharing of the lens LP1 and the second mirror M2 can bechanged, while keeping the total power of the second mirror group GM2unchanged. Thus, the Petzval sum can be controlled as desired. Thedegree of freedom for aberration correction increases, and itcontributes to reduction of the number of optical elements. This is alsothe case with the second field mirror FM2 shown at (B) in FIG. 3 and, bycombining the second field mirror FM2 and the lens LF into a secondfield mirror group, the degree of freedom for the Petzval sum correctionincreases, which contributes to reduction in the number of opticalelements. There arises a necessity that the positive refracting power ofthe second imaging system Gr2 should be made large so as to cancel thelarge negative Petzval sum of the first imaging system Gr1. Since theprincipal light ray height emitted from the first imaging system Gr1passes the outside of the first mirror group GM1, it is incident on thefield optical system Grf at a high position. Thus, the angle of theprincipal light ray entering the second imaging system Gr2 from thefield optical system Grf becomes larger. As a result, in order tomaintain the image-side telecentricity, there arises a necessity thatthe positive refracting power of the second imaging system Gr2 should belarger. Since the positive refracting power of the second imaging systemGr2 can be enlarged without contradiction to these two necessities.,theeffective diameter of the second imaging system Gr2 becomes smaller.Thus, the reduction in size and weight is accomplished.

As regards the incidence angle and reflection angle of light on themirror, because this embodiment concerns a ring field system, theincidence angle and the reflection angle of the light on the mirror canbe made smaller than that in an optical system of a Cassegrain type orSchwarzschild type. Further, in the first imaging system Gr1, the firstmirror M1 is disposed adjacent to a point optically conjugate with apupil, and the light reflected by the second mirror M2 passes about theoutside of the effective diameter of the first mirror group GM1. Sincethe light is not reflected at a high position away from the optical axisof the mirror, the incidence angle and the reflection angle of the lighton the first and second mirrors M1 and M2 do not become extraordinarilylarge. In a case where the field optical system Grf has a structure asshown at (B) in FIG. 3, the spacing between the first and second fieldmirrors FM1 and FM2 is kept large as much as possible. Also, the widthof the light is narrow. Therefore, the incidence angle and thereflection angle do not become extraordinarily large.

As regards the width of the imaging region on the image plane, themirror should be disposed so as to keep the effective light as much aspossible. When the field optical system Grf comprises only a refractivelens system (FIG. 3, (A)) or it includes a mirror (FIG. 3, (B)), in thefirst imaging system Gr1, the object height may be made high within thetolerable range of aberration correction. Thus, this is not an obstacle.In the field optical system Grf having a field mirror (FIG. 3, (B)),since the width of light is narrow, it is easy to avoid an eclipse ofthe effective light flux. Therefore, a sufficient imaging region widthcan be attained.

In the first imaging system Gr1, a positive lens group G1 may bedisposed just after the object plane. This is effective for thecorrection of distortion aberration, for example, and to maintain itsobject-side telecentricity satisfactorily. Therefore, in order to reduceany warp of the object plane (reticle) or image plane (wafer) or todecrease a change in magnification due to defocus, it is desirable toprovide an optical system being telecentric both in the object side andthe image side, by using the positive lens group G1 and the secondimaging system Gr2. In the present invention, as shown in FIG. 3, thesecond mirror M2 should have a half disk-like shape, for separation oflight. The positive lens group G1 may have either a half disk-likeshape, or it may have a disk-like shape for easiness of lens manufactureand lens holding. Further, the second mirror M2 may be formed at thesurface portion below the optical axis. For the same reason, the lensLP1 having a half disk-like shape, may have a disk-like shape. On thatoccasion, the light passes the lens LP1 three times. Similarly, thesecond mirror M2 may be formed at the lower surface portion of the lensLP1. Also, the first mirror M1 may be formed as a back-surface mirror ofthe lens LN1. The mirrors used in the present invention may beback-surface mirrors, with respect to the aberration correction.

As shown at (A) and (B) of FIG. 3, the field optical system includes apositive lens FL1 disposed at the back, on the image plane side, of thefirst mirror group GM1 of the first imaging system Gr1. This structuresuppresses enlargement of the diameter. While it is necessary to formthe first face of the positive lens FL1 to have a discontinuous shapesuch as dual curvature, for example, the first mirror M1 may be formedat the central portion of the positive lens FL1. Further, a field stopmay be disposed at the position of an intermediate image of the firstimaging system, to define a variable imaging region on the image plane.This is effective to make the illumination system (not shown) verysimple.

In the second embodiment, the optical system should preferably satisfythe following conditions.

When the magnification of the second imaging system Gr2 is BG2, thefollowing relation should be satisfied:−0.5<BG 2<−0.05   (1)

When the magnification of the first imaging system Gr1 is BG1, thefollowing relation should be satisfied:−40.0<BG 1<−0.5   (2)

When the Petzval sums of the first imaging system Gr1, of the fieldoptical system Grf and of the second imaging system are P1, Pf and P2,respectively, the following relations are satisfied:P1<0Pf+P 2>0   (3)

When the paraxial distance between the object and the first mirror isLM1, and the distance from the object to a pupil conjugate point definedby an optical element, which is at the object side of the first mirror,is e, these distances satisfy the following relation:0.6<e/LM 1<2.5   (4)

When the paraxial distance between the first and second mirrors is LM2,and the paraxial distance from the object plane to the intermediateimage by the first imaging system OIL, the distance LM1 described abovesatisfies the following relation:0.5<OIL/(LM 1+2×LM 2)<20   (5)

The distances LM1 and LM2 satisfy the following relation:0.2<LM 2/LM 1<0.95   (6)

When the distance from the object plane to the image plane with respectto the projection optical system is L, the distance LM1 described abovesatisfies the following relation:0.15<LM 1/L<0.55   (7)

When the magnification of the first mirror group is BGM1, the followingrelation is satisfied:−2.0<1/BGM 1<0.4   (8)

The condition (1) defines the magnification of the second imaging systemGr2 in a proper range, so as to obtain a good imaging performance and toassure the back focus (image side working distance), while meetingenlargement of the NA. By keeping a negative value throughout the wholerange, the back focus is assured easily.

Here, if the lower limit is exceeded, the power of the second imagingsystem Gr2 becomes small, such that the diameter of the second imagingsystem becomes large, or the virtual object height with respect to thesecond imaging system Gr2 becomes low. As a result, the powers of thegroups constituting the field optical system Grf become larger, causingdifficulties in correction of distortion aberration or curvature offield. Alternatively, the magnification of the first imaging system Gr1becomes too small, such that there may occur interference of thereflection light from the second mirror M2 with the first mirror groupGM1. This makes the power arrangement difficult. On the other hand, ifthe upper limit is exceeded, the power of the second imaging system Gr2increases, and it makes the correction of aberration difficult toaccomplish. Further, the diameter of the field optical system Grfdisadvantageously increases.

The condition (2) defines the magnification of the first imaging systemGr1 so that, while keeping an appropriate power of the first imagingsystem Gr1, the reflection light from the second mirror M2 efficientlypasses without interference with the first mirror group GM1. If thelower limit is exceeded, the width of light becomes large at the outsideof the first mirror group GM1, to cause an enlargement of the fieldoptical system Grf or an increase of the power of the second imagingsystem Gr2. This makes the aberration correction difficult toaccomplish.

If the upper limit is exceeded, the power of the first imaging systemGr1 increases to cause difficulties in aberration correction.Alternatively, there may occur an inconvenience that the reflectionlight from the second mirror M2 interferes with the first mirror groupGM1. Here, the lower limit of the condition (2) may preferably be equalto −5.0.

The condition (3) relates to the Petzval sum which determines the fieldcurvature of the optical system as a whole. The Petzval sum of the wholesystem may preferably be equal to about zero. However, in thisembodiment, due to the presence of the first mirror group GM1, thePetzval sum of the first imaging system Gr1 has a large negative value.In order to cancel this, the total of the Petzval sum of the fieldoptical system Grf and that of the second imaging system Gr2 has a largepositive value. If this condition is not satisfied, for correction ofthe Petzval sum, the number of lenses becomes larger, or the correctionof curvature of field becomes difficult to accomplish.

The condition (4) concerns the positional relation of the pupilconjugate point of the first imaging system and the first mirror M1.Taking into account a decrease of curvature of field or higher orderdistortion aberration and a decrease of the mirror incidence angle suchas described above, it is desirable to take the positional relationsubstantially registered. If the lower limit is exceeded, the heights asthe principal rays from each object height are reflected by the firstmirror M1 differ from each other. This causes increases of higher orderdistortion aberration and the curvature of field. Also, since thediameter of the first mirror group GM1 becomes larger, there occurs aninconvenience of interference of the reflection light from the secondmirror M2 with the first mirror group GM1. If the upper limit isexceeded, similarly the heights as the principal rays from each objectheight are reflected by the first mirror M1 differ from each other, andit causes increases of higher order distortion aberration as well as thecurvature of field. Also, since the angle of the reflection light fromthe second mirror M2 with respect to the optical axis becomes larger,the power sharing or the field optical system Grf becomes large, whichmakes it difficult to accomplish the aberration correction.

Condition (5) concerns the positional relation of the intermediate imageby the first imaging system Gr1 and the first mirror M1. Under thecondition, the reflection light from the second mirror M2 efficientlypasses toward the image side without interference with the first mirrorgroup GM1. As shown in FIG. 3, it is preferable that an intermediateimage is formed substantially outside the first mirror M1. Thus, if thisrange is exceeded, the width of light outside the first mirror M1becomes large, and the diameter of the field optical system Grf becomeslarge. This causes an increase of aberration. Particularly, if the lowerlimit is exceeded, the magnification of the first imaging system Gr1becomes too small, and there may occur an inconvenience of interferenceof the reflection light from the second mirror M2 with the first mirrorgroup GM1. Further, the powers of the first and second mirrors M1 and M2become too large, and the amount of aberration production undesirablyincreases. If the upper limit is exceeded, to the contrary, themagnification of the first imaging system Gr1 becomes too large. As aresult, an excessive space is produced outside the first mirror M1, orthe magnification has to be reduced by means of the second imagingsystem Gr2. Thus, the power balance of the optical system as a whole isundesirably destroyed. The upper limit of the condition (5) maypreferably be equal to 3.0.

Condition (6) defines a proper position of the second mirror M2 withrespect to the first mirror M1. If the lower limit is exceeded, itcauses an inconvenience that the light directed from the object plane tothe first mirror M1 is eclipsed by the second mirror M2. If the upperlimit is exceeded, the second mirror M2 and the object plane come closeto each other, and the space at the object side becomes small.

Condition (7) defines a proper position of the first mirror M1 withrespect to the total length of the optical system. If this range isexceeded, the power balance of the optical system as a whole isundesirably destroyed. Particularly, if the lower limit is exceeded, thepower of the first imaging system Gr1 increases. If the upper limit isexceeded, the power of the second imaging system increases. The balanceof Petzval sum or aberration cancelling relation is undesirablydestroyed.

Condition (8) defines the magnification of the first mirror group GM1 inthe first imaging system Gr1. If this range is exceeded, the power ofthe first mirror group GM1 goes beyond a proper range. The power of thesecond mirror group GM2 for causing the reflection light from the secondmirror M2 to pass through the outside of the first mirror group GM1, isrestricted. This results in higher order aberration or curvature offield. The light may interfere with the first mirror group GM1. Further,the power balance with the second imaging system Gr2 is influenced, tocause the aberration correction more difficult. Particularly, if thelower limit is exceeded, the magnification of the first imaging systemGr1 becomes larger toward the enlargement side, so that the power of thesecond imaging system Gr2 becomes larger. Any way, the aberrationcorrection is difficult to accomplish. The upper limit of the condition(8) may preferably be equal to −0.2.

Particularly, in an embodiment such as shown at (B) in FIG. 3, the fieldoptical system Grf comprises a first field mirror FM1 being a concavemirror having a concave surface facing to the object side, and a secondfield mirror group GFM2 including a second field mirror FM2. The firstfield mirror FM1 is physically disposed at the image plane side of thesecond field mirror group GFM2. The second imaging system Gr2 isconstituted by refractive lenses only, and it has a positive refractingpower. Light from the object is reflected in the first imaging systemGr1 by the first and second mirrors M1 and M2, in this order, and afterthis, the light passes the outside of an effective diameter of the firstmirror group GM1 to the image side. Then, the light is reflected in thefield optical system, by the first and second field mirrors FM1 and FM2in this order. Thereafter, the light goes about the optical axis centerof the first field mirror FM1 to the image plane side, and finally itpasses the second imaging system Gr2. Thus, the projection opticalsystem as a whole is provided along a straight line of optical axis 103.The object plane and the image plane are opposed to each other, at theopposite ends of the optical axis 103. The magnification of theprojection optical system as a whole is at a reduction ratio.

Important features of an embodiment such as shown at (B) in FIG. 3reside in that, in the first imaging system Gr1, the above-describedfunction (c) is used twice such that the reflection is performed twiceby using two mirrors of the first and second mirrors M1 and M2, and thatthe light from the object is directed through the outside of theeffective diameter of the first mirror group GM1 to the image planeside. Also, even in the field optical system Grf, the above-describedfunction (c) is used twice, and the reflection is made twice by usingtwo mirrors of first and second field mirrors FM1 and FM2, so that thelight is directed to the image plane side through the optical axiscentral portion of the first field mirror FM1

The optical system of this embodiment preferably satisfies the followingconditions.

When the magnification of the first imaging system Gr1 is BG1, thefollowing relation should be satisfied:−40.0<BG 1<−0.9   (9)

When the distance between the object plane and the first mirror M1 isLM1, and the distance of a pupil conjugate point defined by an opticalelement, which is at the object side of the first mirror M1, is e, thesedistances satisfy the following relation:0.8<e/LM 1<1.5   (10)

The distance LM1, the distance LM2 between the first and second mirrorsM1 and M2, and the paraxial distance OIL from the object plane to theintermediate image by the first imaging system Gr1 satisfy the followingrelation:0.6<OIL/(LM 1+2×LM 2)<20   (11)

The distance LM1 and the conjugate length L of the projection opticalsystem as a whole satisfy the following relation:0.75<LM 1/L<0.55   (12)

When the magnification of the first mirror group GM1 is BGM1, thefollowing relation is satisfied:−1.2<1/BGM 1<0.4   (13)

The distance LFM1 between the first and second field mirrors FM1 andFM2, and the distance LFM2 between the second field mirror FM2 and theimage plane, satisfy the following relation:0.45<LFM 1/LFM 2<0.8   (14)

Conditions (9) to (13) are similar to those described hereinbefore.Condition (14) defines the positional relation of the first and secondfield mirrors FM1 and FM2. If the lower limit is exceeded, the spacebetween the first and second field mirrors FM1 and FM2 becomes narrower,and the powers of the mirrors become larger. Thus, the aberration at themirror surface disadvantageously increases. If the upper limit isexceeded, the lens space for constituting the second imaging system Gr2becomes narrower, and the aberration disadvantageously increases due toan increase of the power of each lens.

In the second embodiment of the present invention as described above,the optical system comprises a first imaging system, a field opticalsystem and a second imaging system. Two mirrors of the first imagingsystem are used to perform reflection twice, to direct light to theimage plane side. By this, the structure becomes very simple wherein theoptical axis extends along a single straight line. Further, whenpredetermined conditions such as positional relations of the mirrors,and magnification sharing of each imaging system and each mirror group,are satisfied, a sufficient imaging region width is attainable. Thus, acatadioptric projection optical systems, which is small in size andlight in weight, which has optical elements of a reduced number, whichhas incidence angles and reflection angles on the mirrors not being verylarge, and which has a sufficient image side working distance, isaccomplished.

A specific example of the present invention will now be described.Examples 1–4 are those based on the first embodiment described above,and examples 5–21 are those based on the second embodiment.

EXAMPLE 1

FIG. 4 shows a specific lens structure of Example 1. The projectionmagnification was 1:4, and the design base wavelength was 157 nm. Theglass material was fluorite.

The projection optical system comprises, in an order from the objectside, a refractive lens group L1 having a positive refracting power, arefractive lens group R which is a reciprocal optical system whereinboth the incidence light and reflection light of a first mirror M1 (tobe placed later) transmit therethrough, a concave mirror (first mirror)M1, a concave mirror (second mirror) M2, a field lens group F, and asecond imaging optical system G2.

In this embodiment, the image side numerical aperture was NA=0.6, thereduction magnification was 1:4, and the object-to-image distance (fromthe first object plane to the second object plane) was L=about 1170 mm.The design base wavelength was 157 nm. In the range of the image heightof about 11.25–19.75 mm, the aberration was corrected. An abaxialexposure region of arcuate shape, having at least a size of about 26 mmin the lengthwise direction and 8 mm in the width was assured.

FIG. 8 shows longitudinal and transverse aberrations of this example,and structural specifications of a numerical example are shown inTable 1. The aberrations in the drawing concern the base wavelength 157nm ±2 pm.

The refractive lens group L1 comprises, in an order from the objectside, an aspherical positive lens having a biconvex shape, and anaspherical positive lens of approximately flat-convex shape having aconvex surface facing to the object side. With the refractive lens groupL1, the telecentricity and the balance of distortion aberration are heldsatisfactorily and, additionally, the light is refracted toward thefirst mirror M1 and the reciprocal optical system R.

The refractive lens group R (reciprocal optical system) comprises anaspherical negative lens of a meniscus shape, having a concave surfacefacing to the object side. With this negative lens, mainly the curvatureof field and axial chromatic aberration are corrected. Also, with theaspherical surface, mainly the spherical aberration and coma aberration,for example, are corrected.

The first mirror M1 comprises an aspherical surface concave mirrorhaving a concave surface facing to the object side. It has a positiverefracting power and functions to produce a curvature of field in thepositive direction to cancel the negative curvature of field of thesecond imaging optical system which comprises a refractive lens. Thesecond mirror M2 comprises a concave mirror having a concave surfacefacing to the image side, and it serves to direct the abaxial light onthe first object 101 to the outside of the effective diameter of thefirst mirror M1. An intermediate image is formed adjacent to the outsideof the effective diameter of the first mirror M1. In this example, thefirst imaging optical system is an enlarging system, and separationbetween the reflection light from the first mirror M1 and the reflectionlight from the second mirror M2 is accomplished easily.

In this example, a single aspherical lens of biconvex shape is disposed,as a field lens group F, adjacent to the intermediate image.

The second imaging optical system G2 comprises, in an order from theobject side, an aspherical positive lens of a meniscus shape having aconcave surface facing to the object side, an aperture stop, anaspherical positive lens of approximately flat-convex shape having aconvex surface facing to the image side, an aspherical positive lenshaving a convex surface facing to the object side, an aspherical lenshaving a concave surface facing to the image side, an aspherical lenshaving a convex surface facing to the image side, and an asphericalpositive lens having a convex surface facing to the object side. Thesecond imaging optical system G2 provides a reduction system for imagingthe light from the field lens group F onto the second object surface102. Because the light is incident on the aperture stop with a certainangle, the effective diameter of the refractive lens about the aperturestop can be suppressed to be small. With this arrangement, variousaberrations such as axial chromatic aberration and spherical aberrationcan be reduced and, additionally, they can be cancelled with variousaberrations produced in the first imaging optical system. Thus,satisfactory aberration correction is accomplished in the whole system.

In this example, the second mirror M2 is a spherical mirror, and all theremaining elements have an aspherical surface. However, the refractivelenses of the first and second imaging optical systems G1 and G2 and thefirst mirror M1 may not be defined by an aspherical surface. A sphericallens or spherical mirror may be used therefor. However, use of anaspherical surface can correct the aberrations better.

EXAMPLE 2

FIG. 5 shows a specific lens structure of Example 2. The projectionmagnification was 1:4, and the design base wavelength was 157 nm. Theglass material was fluorite.

The projection optical system comprises, in an order from the objectside, a refractive lens group L1 having a positive refracting power, arefractive lens group R which is a reciprocal optical system whereinboth the incidence light and reflection light of a first mirror M1 (tobe placed later) transmit therethrough, a concave mirror (first mirror)M1, a flat mirror (second mirror) M2, a field lens group F, and a secondimaging optical system G2.

In this embodiment, the image side numerical aperture was NA=0.60, thereduction magnification was 1:4, and the object-to-image distance (fromthe first object plane to the second object plane) was L=about 1205 mm.In the range of the image height of about 0–16.25 mm, the aberration wascorrected. An abaxial exposure region of arcuate shape, having at leasta size of about 26 mm in the lengthwise direction and 4 mm in the widthwas assured.

FIG. 9 shows longitudinal and transverse aberrations of this example,and structural specifications of a numerical example are shown in Table2. The aberrations in the drawing concern the base wavelength and awavelength ±2 pm.

The refractive lens group L1 comprises, in an order from the objectside, a single aspherical positive lens having a biconvex shape. Thegroup Le including two mirrors comprises a refractive lens group R(reciprocal optical system) and first and second mirrors M1 and M2.

The refractive lens group R (reciprocal optical system) comprises anaspherical negative lens having a concave surface facing to the objectside. The first mirror M1 comprises an aspherical surface concave mirrorhaving a concave surface facing to the object side. The second mirror M2is a flat mirror.

A field lens group F is disposed adjacent to an intermediate image asformed by the first imaging optical system. The field lens group Fcomprises, in an order from the object side, an aspherical positive lensof biconvex shape, and an aspherical positive lens of meniscus shapehaving a concave surface facing to the image side.

The second imaging optical system G2 comprises, in an order from theobject side, an aspherical negative lens of meniscus shape having aconcave surface facing to the image side, an aperture stop, anaspherical positive lens of biconvex shape, a spherical positive lens ofmeniscus shape having a convex surface facing to the object side, anaspherical positive lens having a convex surface facing to the imageside, an aspherical positive lens having a convex surface facing to theimage side, and an aspherical positive lens of approximately flat-convexshape having a convex surface facing to the object side. In thisexample, the second imaging optical system G2 includes a strong negativelens.

EXAMPLE 3

FIG. 6 shows a specific lens structure of Example 3. The projectionmagnification was 1:4, and the design base wavelength was 157 nm. Theglass material was fluorite.

In this embodiment, the image side numerical aperture was NA=0.68, thereduction magnification was 1:4, and the object-to-image distance (fromthe first object plane to the second object plane) was L=about 1185 mm.In the range of the image height of about 11.25–20.25 mm, the aberrationwas corrected. An abaxial exposure region of arcuate shape, having atleast a size of about 26 mm in the lengthwise direction and 8 mm in thewidth was assured.

FIG. 10 shows longitudinal and transverse aberrations of this example,and structural specifications of a numerical example are shown in Table3. The aberrations in the drawing concern the base wavelength 157 mn 2pm.

The refractive lens group L1 comprises, in an order from the objectside, an aspherical positive lens of meniscus shape having a concavesurface facing to the object side, and an aspherical positive lens ofbiconvex shape. The refractive lens group R (reciprocal optical system)comprises an aspherical negative lens of meniscus shape, having aconcave surface facing to the object side.

The first mirror M1 comprises an aspherical surface concave mirrorhaving a concave surface facing to the object side. It has a positiverefracting power and functions to produce a curvature of field in thepositive direction to cancel the negative curvature of field of thesecond imaging optical system which comprises a refractive lens. Thesecond mirror M2 comprises an aspherical surface concave mirror having aconcave surface facing to the image side, and it serves to direct theabaxial light on the first object 101 to the outside of the effectivediameter of the first mirror M1. An intermediate image is formedadjacent to the outside of the effective diameter of the first mirrorM1. In this example, a field lens group F is disposed adjacent to theintermediate image. This field lens group F comprises, in an order fromthe object side, an aspherical positive lens of a meniscus shape havinga convex surface facing to the image side, and an aspherical positivelens of a biconvex shape.

The second imaging optical system G2 comprises, in an order from theobject side, an aspherical positive lens of a meniscus shape having aconvex surface facing to the object side, an aperture stop, anaspherical positive lens of approximately flat-convex shape having aconvex surface facing to the image side, an aspherical positive lenshaving a convex surface facing to the object side, an aspherical lenshaving a concave surface facing to the image side, an aspherical lenshaving a convex surface facing the to the image side, and an asphericalpositive lens having a convex surface facing to the object side. Thesecond imaging optical system G2 provides a reduction system for imagingthe light from the field lens group F onto the second object surface102. Because the light is incident on the aperture stop with a certainangle, the effective diameter of the refractive lens about the aperturestop can be suppressed to be small. With this arrangement, variousaberrations such as axial chromatic aberration and spherical aberrationcan be reduced and, additionally, they can be cancelled with variousaberrations produced in the first imaging optical system. Thus,satisfactory aberration correction is accomplished in the whole system.

EXAMPLE 4

FIG. 7 shows a specific lens structure of Example 4. The projectionmagnification was 1:5, and the design base wavelength was 157 nm(wavelength of an F₂ excimer laser). The glass material was fluorite.

In this embodiment, the image side numerical aperture was NA=0.60, andthe object-to-image distance (from the first object plane to the secondobject plane) was L=about 1411 mm. In the range of the image height ofabout 9–15 mm, the aberration was corrected. An abaxial exposure regionof an arcuate shape, having at least a size of about 20.8 mm in thelengthwise direction and 5 mm in the width was assured.

FIG. 11 shows longitudinal and transverse aberrations of this example,and structural specifications of a numerical example are shown in Table4.

The projection optical system comprises, in an order from the objectside, a refractive lens group L1 having a positive refracting power, aconcave mirror (first mirror) M1, a concave mirror (second mirror) M2,and a second imaging optical system G2. In this example, there is norefractive lens group R or field lens group F, inside the group L2having two mirrors.

The refractive lens group L1 comprises, in an order from the objectside, an aspherical positive lens having a convex surface facing to theimage side, and an aspherical positive lens of biconvex shape.

The first mirror M1 comprises an aspherical surface concave mirrorhaving a concave surface facing to the object side. The second mirror M2comprises an aspherical surface concave mirror having a concave surfacefacing to the image side, and it serves to direct the abaxial light onthe first object 101 to the outside of the effective diameter of thefirst mirror M1. An intermediate image is formed adjacent to the outsideof the effective diameter of the first mirror M1. In this example, thefirst imaging optical system G1 constitutes a reduction system.

The second imaging optical system G2 comprises, in an order from theobject side, an aspherical positive lens of biconvex shape, an aperturestop, two aspherical positive lenses of meniscus shape having a concavesurface facing to the image side, and an aspherical positive lens havinga convex surface facing to the object side. The second imaging opticalsystem G2 provides a reduction system for imaging the light from thesecond mirror M2 upon the second object surface 102.

In the four examples described above, except Example 2, the first mirrorM1 is defined by an aspherical surface. Further, except Examples 1 and2, all the refractive lenses are aspherical lenses. However, a sphericallens may be used in combination.

As regards the aspherical lenses, although the surface opposite to theaspherical surface is spherical, it may be flat or spherical. Further,the first mirror or the second mirror may be provided by an asphericalsurface having no refracting power.

In Examples 1–4 described above, the exposure region has an arcuateshape. However, as long as it is inside the aberration-corrected range,any other shape such as a rectangular shape may be used. Further, whilethe group L2 having two mirrors is shown as including the refractivelens group R, the refractive lens group R and the mirrors may beintegrated (Mangin mirror structure). Alternatively, the refractive lensgroup R and the second mirror M2 may be integrated into a Mangin mirrorstructure.

In the examples described above, while there is aspherical surface datain which the conical constant k is taken as zero, the design may be madewhile using the conical constant as a variable.

The exposure light source used an F₂ laser of a wavelength 157 nm.However, a KrF excimer laser (wavelength 248 nm) or an ArF excimer laser(wavelength 193 nm), for example, may be used. Particularly, theinvention is effective when the wavelength is shortened and usableoptical materials are limited, and the number of optical elements shouldbe reduced. Thus, the present invention is effective for an opticalsystem to be used with a wavelength not longer than 250 nm.

In these examples, fluorite was used as the glass material for thewavelength 157 nm from the F₂ excimer laser. However, any other glassmaterial such as fluorine-doped quartz, for example, may be used. When aKrF or an ArF light source is used, fluorite and quartz may be used incombination, or only one of them may be used.

EXAMPLE 5

FIG. 12 is an optical path view of Example 5 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:6. The lens conjugatedistance L was 1005 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 8.64 mm to 14.40 mm. The optical system was provided by asmall number of optical elements, ie., two mirrors and nine lenses.

In this example, denoted at r1–r2 are components of a first imagingsystem Gr1, and it comprises a first mirror M1 (concave surface) and asecond mirror M2 (concave surface). Denoted at r3–r8 are components of afield optical system Grf, and it comprises two positive lenses,including a positive lens FL1 disposed at the image side of the firstmirror M1, and one negative lens. Denoted at r9–r21 are components of asecond imaging system Gr2, and it comprises a stop r11, four positivelenses and two negative lenses.

In this example, the magnification of the first imaging system Gr1 is atthe most reduction rate and, therefore, a value close to the upper limitof condition (2) is taken.

Structural specifications of numerical examples are shown in Table 5. Inthis example, an image side working distance of 30 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 224.7 mm. While the largest diameter of theoptical system as a whole is 227 mm at the field optical system, thelargest diameter of the second imaging system is as small as 125 mm,regardless of that the NA is 0.6. FIG. 29 shows aberrations, and fromthis, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 6

FIG. 13 is an optical path view of Example 6 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:5. The lens conjugatedistance L was 956 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 7.2 mm to 14.40 mm. The optical system was provided by asmall number of optical elements, i.e., two mirrors and ten lenses.

In this example, denoted at r1–r4 are components of a first imagingsystem Gr1, and it comprises a positive lens (group G1) at r1 and r2, afirst mirror M1 (concave surface) and a second mirror M2 (concavesurface). Denoted at r5–r10 are components of a field optical systemGrf, and it comprises two positive lenses, including a positive lens FL1disposed at the image side of the first mirror M1, and one negativelens. Denoted at r11–r23 are components of a second imaging system Gr2,and it comprises a stop r13, four positive lenses and two negativelenses.

In this example, the magnification of the first imaging system Gr1 is ata smaller rate and, therefore, a value close to the lower limit ofcondition (8) is taken. Further, based on this, the intermediate imageat a paraxial portion of the first imaging system Gr1 is formed at aposition after the light is reflected by the first mirror M1 and beforeit is incident on the second mirror M2. Therefore, a value close to thelower limit of condition (5) is taken.

Structural specifications of numerical examples are shown in Table 6. Inthis example, an image side working distance of 31 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 232.1 mm. While the largest diameter of theoptical system as a whole is 196 mm at the field optical system, thelargest diameter of the second imaging system is as small as 143 mm,regardless that the NA is 0.6. FIG. 30 shows aberrations, and from this,it is seen that aberrations are corrected satisfactorily.

EXAMPLE 7

FIG. 14 is an optical path view of Example 5 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:5. The lens conjugatedistance L was 1199 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 8.4 mm to 14.0 mm. The optical system was provided by asmall number of optical elements, i.e., two mirrors and nine lenses.

In this example, denoted at r1–r4 are components of a first imagingsystem Gr1, and it b comprises a positive lens (group G1) at r1 and r2,a first mirror M1 (concave surface) and a second mirror M2 (concavesurface). Denoted at r5–r12 are components of a field optical systemGrf, and it comprises three positive lenses, including a positive lensFL1 disposed at the image side of the first mirror M1, and one negativelens. Denoted at r13–r21 are components of a second imaging system Gr2,and it comprises a stop r13 and four positive lenses.

In this example, since the position of a pupil conjugate point of thefirst imaging system Gr1 is largely remote, in the positive direction,from the position of the first mirror M1, a value close to the upperlimit of condition (4) is taken. Further, since the distance from theobject plane to the first mirror M1 is short as compared with the wholeoptical length, a value close to the lower limit of condition (7) istaken.

Structural specifications of numerical examples are shown in Table 7. Inthis example, an image side working distance of 31 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 333.8 mm. While the largest diameter of theoptical system as a whole is 250 mm at the field optical system, thelargest diameter of the second imaging system is as small as 143 mm,regardless of the NA is 0.6. FIG. 31 shows aberrations, and from this,it is seen that aberrations are corrected satisfactorily.

EXAMPLE 8

FIG. 15 is an optical path view of Example 8 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:5. The lens conjugatedistance L was 1198 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 8.4 mm to 14.0 mm. The optical system was provided by asmall number of optical elements, i.e., two mirrors and ten lenses.

In this example, denoted at r1–r10 are components of a first imagingsystem Gr1, and it comprises a positive lens (group G1), a first mirrorM1 (concave mirror) and a second mirror (concave mirror) M2. The imagingsystem group G1 comprises a positive lens at r1 and r2, negative lensesat r3 and r4; r6 and r7; and r9 and r10 a of the same type which arephysically disposed between the first and second mirrors M1 and M2.Denoted at r11–r18 are components of a field optical system Grf, and itcomprises three positive lenses, including a positive lens FL1 disposedat the image side of the first mirror M1, and one negative lens. Denotedat r19–r27 are components of a second imaging system Gr2, and itcomprises a stop r19 and four positive lenses.

In this example, the negative lenses are provided in the first imagingsystem Gr1, between the first mirror M1 and the second concave mirrorM2, so as to avoid the inconvenience of interference of the reflectionlight from the second mirror with the first mirror M1 and also tocorrect distortion aberration, for example.

Structural specifications of numerical examples are shown in Table 8. Inthis example, an image side working distance of 36.1 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 337.6 mm. While the largest diameter of theoptical system as a whole is 245 mm at the field optical system, thelargest diameter of the second imaging system is as small as 142 mm,regardless that the NA is 0.6. FIG. 32 shows aberrations, and from this,it is seen that aberrations are corrected satisfactorily.

EXAMPLE 9

FIG. 16 is an optical path view of Example 9 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:5. The lens conjugatedistance L was 1166 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 7.7 mm to 14.0 mm. The optical system was provided by asmall number of optical elements, i.e., two mirrors and twelve lenses.

In this example, denoted at r1–r14 are components of a first imagingsystem Gr1, and it comprises a positive lens (group G1) at r1 and r2,and positive lenses LP1 at r3 and r4; r10 and r11; and r13 and r14 ofthe same type which constitute a second mirror group GM2 in combinationwith a second mirror M2. Also, it comprises negative lenses LN1 at r5and r6; and r8 and r9 of the same type, for constituting a first mirrorgroup GM1 in combination with a first mirror M1.

Denoted at r15–r22 are components of a field optical system Grf, and itcomprises three positive lenses, including a positive lens FL1 disposedat the image side of the first mirror M1, and one negative lens. Denotedat r23–r33 are components of a second imaging system Gr2, and itcomprises a stop r27, four positive lenses and one negative lens.

In this example, the position of the intermediate image formed by thefirst imaging system Gr1 is substantially coincident with the positionof the first mirror M1, and the intermediate image is formed outside thefirst mirror group GM1. Therefore, undesirable interference between thelight and the first mirror group GM1 can be avoided easily. Further, thestructure is efficient since enlargement of the diameter of the fieldoptical system can be suppressed. The second mirror group GM2 isprovided by the positive lens LP1 and the second mirror M2, to therebycontrol the Petzval sum. On the other hand, since the imaging state ofthe intermediate image is moderate, a field stop may be provided at thatposition.

Structural specifications of numerical examples are shown in Table 9. Inthis example, an image side working distance of 30.3 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 400.5 mm. While the largest diameter of theoptical system as a whole is 213 mm at the field optical system, thelargest diameter of the second imaging system is as small as 157 mm,regardless that the NA is 0.6. FIG. 33 shows aberrations, and from this,it is seen that aberrations are corrected satisfactorily.

EXAMPLE 10

FIG. 17 is an optical path view of Example 10 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1;5. The lens conjugatedistance L was 1160 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 7.7 mm to 14.0 mm. The optical system was provided by asmall number of optical elements, i.e., two mirrors and twelve lenses.

In this example, denoted at r1–r14 are components of a first imagingsystem Gr1, and it comprises a positive lens (group G1) at r1 and r2,and positive lenses LP1 at r3 and r4; r10 and r11; and r13 and r14 ofthe same type which constitute a second mirror group GM2 in combinationwith a second mirror M2. Also, it comprises negative lenses LN1 at r5and r6; and r8 and r9 of the same type, for constituting a first mirrorgroup GM1 in combination with a first mirror M1.

Denoted at r15–r22 are components of a field optical system Grf, and itcomprises three positive lenses, including a positive lens FL1 disposedat the image side of the first mirror M1, and one negative lens. Denotedat r23–r33 are components of a second imaging system Gr2, and itcomprises a stop r27, four positive lenses and one negative lens.

In this example, particularly, the first mirror group GM1 of the firstimaging system Gr1 is provided by the negative lens LN1 and the firstmirror M1, and the power of each element is strengthened. By this, theeffect of correcting chromatic aberration with respect to the wholeoptical system is enhanced. Further, the second mirror group GM2 isprovided by the positive lens LP1 and the second mirror M2, to therebycontrol the Petzval sum.

Structural specifications of numerical examples are shown in Table 10.In this example, an image side working distance of 30.0 mm is assured,and the total glass material length along the optical path isextraordinarily shortened to 375.9 mm. While the largest diameter of theoptical system as a whole is 266 mm at the field optical system, thelargest diameter of the second imaging system is as small as 105 mm,regardless that the NA is 0.6. FIG. 34 shows aberrations with respect tothe base wavelength 157 nm and a wavelength range of 2 pm. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 11

FIG. 18 is an optical path view of Example 11 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:4. The lens conjugatedistance L was 1430 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 8.19 mm to 13.65 mm. The optical system was provided by asmall number of optical elements, i.e., two mirrors and twelve lenses.

In this example, denoted at r1–r12 are components of a first imagingsystem Gr1, and it comprises a positive lens (group G1) at r1 and r2,and negative lenses LN1 at r3 and r4; and r6 and r7 of the same typewhich constitute a first mirror group GM1 in combination with a firstmirror M1. Also, it comprises positive lenses LP1 at r8 and r9; and r11and r12 of the same type, for constituting a second mirror group GM2 incombination with a second mirror M2.

Denoted at r13–r20 are components of a field optical system Grf, and itcomprises three positive lenses, including a positive lens FL1 disposedat the image side of the first mirror M1, and one negative lens. Denotedat r21–r31 are components of a second imaging system Gr2, and itcomprises a stop r25, four positive lenses and one negative lens.

In this example, like Example 10, due to the structure of the firstmirror group GM1 as described, the effect of correcting chromaticaberration is enhanced. Further, the second mirror group GM2 is providedby the positive lens LP1 and the second mirror M2, to thereby controlthe Petzval sum.

Structural specifications of numerical examples are shown in Table 11.In this example, an image side working distance of 30.0 mm is assured,and the total glass material length along the optical path isextraordinarily shortened to 371.9 mm. While the largest diameter of theoptical system as a whole is 328 mm at the field optical system, thelargest diameter of the second imaging system is as small as 141 mm,regardless that the NA is 0.6. FIG. 35 shows aberrations with respect tothe base wavelength 157 nm and a wavelength range of 2 pm. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 12

FIG. 19 is an optical path view of Example 12 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:4. The lens conjugatedistance L was 1430 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 8.19 mm to 13.65 mm. The optical system was provided by asmall number of optical elements, i.e., two mirrors and twelve lenses,like Example 11.

In this example, denoted at r1–r12 are components of a first imagingsystem Gr1, and it comprises a positive lens (group G1) at r1 and r2,and negative lenses LN1 at r3 and r4; and r6 and r7 of the same typewhich constitute a first mirror group GM1 in combination with a firstmirror M1. Also, it comprises positive lenses LP1 at r8 and r9; and r11and r12 of the same type, for constituting a second mirror group GM2 incombination with a second mirror M2. In FIG. 20, the positive lens groupG1 as well as the positive lens LP1 are of half disk-like shape.

Denoted at r13–r20 are components of a field optical system Grf, and itcomprises three positive lenses, including a positive lens FL1 ofdoughnut shape, being hollow at its center, and being disposed outsidethe first mirror M1, and one negative lens. Denoted at r21–r31 arecomponents of a second imaging system Gr2, and it comprises a stop r25,four positive lenses and one negative lens.

In this example, since the pupil conjugate point of the first imagingsystem Gr1 is placed closer to the object side, a value close to thelower limit of condition (4) is taken. Further, like Example 10, due tothe structure of the first mirror group GM1 as described, the effect ofcorrecting chromatic aberration is enhanced. Also, the positive lens FL1of the field optical system Grf is made into a doughnut shape, and thefirst mirror group GM1 of the first imaging system Gr1 is disposed atthe central portion of the doughnut shape. With this structure, thelight rays can be refracted at a position closer to the object side and,therefore, the powers of the field optical system Grf and the secondimaging system Gr2 can be made smaller. This is very advantageous withrespect to the aberration correction. Further, the second mirror groupGM2 is provided by the positive lens LP1 and the second mirror M2, tothereby control the Petzval sum.

Structural specifications of numerical examples are shown in Table 12.In this example, an image side working distance of 30.0 mm is assured,and the total glass material length along the optical path isextraordinarily shortened to 377.0 mm. While the largest diameter of theoptical system as a whole is 328 mm at the field optical system, thelargest diameter of the second imaging system is as small as 144 mm,regardless that the NA is 0.6. FIG. 36 shows aberrations with respect tothe base wavelength 157 nm and a wavelength range of 2 pm. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 13

FIG. 20 is an optical path view of Example 13 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:5. The lens conjugatedistance L was 1100 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 10.24 mm to 13.65 mm. The optical system was provided by anextraordinarily simple structure, i.e., with four mirrors and fivelenses.

In this example, denoted at r1–r2 are components of a first imagingsystem Gr1, and it comprises a first mirror M1 (concave surface) and asecond mirror M2 (concave surface), only. Denoted at r3–r4 arecomponents of a field optical system Grf, and it comprises a first fieldmirror FM1 (concave surface) and a second field mirror FM2 (convexsurface), only. Denoted at r5–r15 are components of a second imagingsystem Gr2, and it comprises a stop r5, four positive lenses and onenegative lens.

In this example, the first mirror M1 is positioned relatively at theobject side, with respect to the conjugate distance of the whole opticalsystem, and therefore a value close to the lower limit of condition (12)is taken

Structural specifications of numerical examples are shown in Table 22.In this example, an image side working distance of 30.0 mm is assured,and the total glass material length along the optical path isextraordinarily shortened to 192.2 mm. While the largest diameter of theoptical system as a whole is 388 mm at the field optical system, thelargest diameter of the second imaging system is as small as 167 mm,regardless that the NA is 0.6. FIG. 37 shows aberrations. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 14

FIG. 21 is an optical path view of Example 14 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:5. The lens conjugatedistance L was 1100 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 10.24 mm to 13.65 mm. The optical system was provided by asimple structure, i.e., with four mirrors and six lenses (one lens addedto Example 13).

In this example, denoted at r1–r2 are components of a first imagingsystem Gr1, and it comprises a first mirror M1 (concave surface) and asecond mirror M2 (concave surface which is very close to a flatsurface), only. Denoted at r3–r8 are components of a field opticalsystem Grf, and it comprises a first field mirror FM1 (concave surface),a second field mirror FM2 (convex surface), and negative lenses LF at r4and r5; and r7 and r8 of the same type. Denoted at r9–r19 are componentsof a second imaging system Gr2, and it comprises a stop r9, fourpositive lenses and one negative lens.

In this example, with use of the second field mirror group GFM2 which isprovided by the second field mirror FM2 (concave) and the negative lensLF, the Petzval sum is also controlled. Further, the magnification ofthe second imaging system Gr2 is made small, such that a value close tothe upper limit of condition (1) is taken. Since the first imagingsystem Gr1 does not include the positive lens group G1, the secondmirror M2 is positioned closer to the object side. Therefore, a valueclose to the upper limit of condition (6) is taken.

Structural specifications of numerical examples are shown in Table 14.In this example, an image side working distance of 30 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 156.4 mm. While the largest diameter of theoptical system as a whole is 444 mm at the field optical system, thelargest diameter of the second imaging system is as small as 144 mm,regardless that the NA is 0.6. FIG. 38 shows aberrations. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 15

FIG. 22 is an optical path view of Example 15 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:4. The lens conjugatedistance L was 1190 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 9.56 mm to 13.65 mm. The optical system was provided by useof four mirrors and eight lenses (two lenses added to Example 13).

In this example, denoted at r1–r8 are components of a first imagingsystem Gr1, and it comprises a positive lens (G1) at r1 and r2, negativelenses LN1 at r3 and r4; and r6 and r7 of the same type, a first mirrorM1 (concave surface) and a second mirror M2 (convex surface). Denoted atr9–r14 are components of a field optical system Grf, and it comprises afirst field mirror FM1 (concave surface), a second field mirror FM2(convex surface), and positive lenses LF at r10 and r11; and r13 and r14of the same type. Denoted at r15–r25 are components of a second imagingsystem Gr2, and it comprises a stop r15, four positive lenses and onenegative lens.

In this example, the convex lens group G1 is provided in the firstimaging system Gr1, by which the optical system is made telecentric onthe object side Also, the first mirror group GM1 is provided by thenegative lens LN1 and the first mirror M1, by which color correction isperformed. Further, with use of the second field mirror group GFM2 whichis provided by the second field mirror FM2 (convex) and the positivelens LF, the Petzval sum is also controlled. Further, since the pupilconjugate point of the first imaging system Gr1 is closer to the objectside, a value close to the lower limit of condition (10) is taken. Also,since the spacing between the second and first field mirrors FM2 and FM1is relatively large, a value close to the upper limit of condition (14)is taken.

Structural specifications of numerical examples are shown in Table 15.In this example, an image side working distance of 36 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 203.7 mm. While the largest diameter of theoptical system as a whole is 512 mm at the field optical system, thelargest diameter of the second imaging system is as small as 146 mm,regardless that the NA is 0.6. FIG. 39 shows aberrations with respect tothe base wavelength 157 nm and a wavelength range of 4 pm. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 16

FIG. 23 is an optical path view of Example 16 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:5. The lens conjugatedistance L was 1190 mm. The optical system had an exposure region(imaging region) upon an image plane of an arcuate shape at the imageheight from 9.56 m to 13.65 mm. The optical system was provided by useof four mirrors and nine lenses (one lens added to Example 15).

In this example, denoted at r1–r8 are components of a first imagingsystem Gr1, and it comprises a positive lens (G1) at r1 and r2, negativelenses LN1 at r3 and r4; and r6 and r7 of the same type, a first mirrorM1 (concave surface) and a second mirror M2 (convex surface). Denoted atr9–r16 are components of a field optical system Grf, and it comprises apositive lens FL1, a first field mirror FM1 (concave surface), a secondfield mirror FM2 (convex surface), and negative lenses LF at r12 andr13; and r15 and r16 of the same type. Denoted at r17–r27 are componentsof a second imaging system Gr2, and it comprises a stop r17, fourpositive lenses and one negative lens.

In this example, the magnification of the first imaging system Gr1 isslightly enlarged to −3.838× and, in consideration of it, the positivelens FL1 included in the field optical system Grf is disposed at theback on the image side, of the first mirror M1 to thereby suppress theincrease of diameter. Further, with use of the first mirror group GM1including the negative lens LN1 and the first mirror M1, as well as thesecond field mirror group GFM2 which is provided by the second fieldmirror FM2 (convex) and the negative lens LF, the Petzval sum is alsocontrolled.

Structural specifications of numerical examples are shown in Table 16.In this example, an image side working distance of 36 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 292.8 mm. While the largest diameter of theoptical system as a whole is 294 mm at the field optical system, thelargest diameter of the second imaging system is as small as 184 mm,regardless that the NA is 0.6. FIG. 40 shows aberrations. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 17

FIG. 24 is an optical path view of Example 17 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:4. The lens conjugatedistance L was 1188 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 9.56 mm to 13.65 mm. The optical system was provided by useof four mirrors and nine lenses.

In this example, denoted at r1–r8 are components of a first imagingsystem Gr1, and it comprises a positive lens (G1) at r1 and r2, negativelenses LN1 at r3 and r4; and r6 and r7 of the same type, a first mirrorM1 (concave surface) and a second mirror M2 (convex surface). Denoted atr9–r16 are components of a field optical system Grf, and it comprises apositive lens FL1, a first field mirror FM1 (concave surface), a secondfield mirror FM2 (concave surface), and positive lenses LF at r12 andr13; and r15 and r16 of the same type. Denoted at r17–r27 are componentsof a second imaging system Gr2, and it comprises a stop r17, fourpositive lenses and one negative lens.

In this example, the second field mirror FM2 as well as the positivelens LF, at the back thereof, are provided in the field optical systemGrf. With this structure, an intermediate image is formed also justafter (image side) of the positive lens LP. Thus, in the whole opticalsystem, the imaging is executed three times. Therefore, after the fieldoptical system Grf, the positive power becomes larger and the space ismade smaller. Thus, the position of the first mirror M1 is placedrelatively at the image side, and a value close to the upper limit ofcondition (12) is taken. Further, since the magnification at the firstmirror M1 is made smaller, a value close to the lower limit of condition(13) is taken. As a result, the paraxial intermediate image at the firstimaging system Gr1 is produced after the light which is reflected by thesecond mirror M2 and at a position closer to the object side. Thus, avalue close to the lower limit of condition (11) is taken. Additionally,with use of the first mirror group GM1 provided by the negative lens LN1and the first mirror M1, color correction is made.

Structural specifications of numerical examples are shown in Table 17.In this example, an image side working distance of 36 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 303.3 mm. While the largest diameter of theoptical system as a whole is 323 mm at the field optical system, thelargest diameter of the second imaging system is as small as 125 mm,regardless that the NA is 0.6. FIG. 41 shows aberrations, with respectto the base wavelength 157 nm and a wavelength range of 2 pm. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 18

FIG. 25 is an optical path view of Example 18 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:4. The lens conjugatedistance L was 1190 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 10.0 mm to 20.0 mm. The optical system was provided by useof four mirrors and nine lenses, like Example 16.

In this example, denoted at r1–r8 are components of a first imagingsystem Gr1, and it comprises a positive lens (G1) at r1 and r2, negativelenses LN1 at r3 and r4; and r6 and r7 of the same type, a first mirrorM1 (concave surface) and a second mirror M2 (convex surface). Denoted atr9–r16 are components of a field optical system Grf, and it comprises apositive lens FL1, a first field mirror FM1 (concave surface), a secondfield mirror FM2 (convex surface), and positive lenses LF at r12 andr13; and r15 and r16 of the same type. Denoted at r17–r27 are componentsof a second imaging system Gr2, and it comprises a stop r17, fourpositive lenses and one negative lens.

In this example, with use of the first mirror group GM1 as provided bythe negative lens LN1 and the first mirror M1, color correction isaccomplished Further, with use of the second field mirror group GFM2which is provided by the second field mirror FM2 (convex) and thepositive lens LF, the Petzval sum is also controlled.

Structural specifications of numerical examples are shown in Table 18.In this example, an image side working distance of 37 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 286.8 mm. While the largest diameter of theoptical system as a whole is 442 mm at the field optical system, thelargest diameter of the second imaging system is as small as 165 mm,regardless that the NA is 0.6. FIG. 42 shows aberrations, with respectto the base wavelength 157 nm and a wavelength range of 4 pm. From thedrawing, it is seen that the aberrations are corrected satisfactorily.

EXAMPLE 19

FIG. 26 is an optical path view of Example 18 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:5. The lens conjugatedistance L was 934 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 7.7 mm to 14.0 mm. The optical system was provided by use offour mirrors and ten lenses.

In this example, denoted at r1–r10 are components of a first imagingsystem Gr1, and it comprises positive lenses (G1) at r1 and r2; and r3and r4, negative lenses LN1 at r5 and r6; and r8 and r9 of the sametype, a first mirror M1 (concave surface) and a second mirror M2(concave surface). Denoted at r11–r18 are components of a field opticalsystem Grf, and it comprises a positive lens FL1, a first field mirrorFM1 (concave surface), a second field mirror FM2 (convex surface), andpositive lenses LF at r14 and r15; and r17 and r18 of the same type.Denoted at r19–r29 are components of a second imaging system Gr2, and itcomprises a stop r19, four positive lenses and one negative lens.

In this example with the use of the first mirror group GM1 as providedby the negative lens LN1 and the first mirror M1, color correction isaccomplished. Further with the use of the second field mirror group GFM22 which is provided by the second field mirror FM2 (convex) and thepositive lens LF, the Petzval sum is also controlled. Since themagnification of the first imaging system Gr1 is at the most reductionrate, a value close to the upper limit of condition (9) is taken. Sincethe spacing between the second and first field mirrors FM2 and FM1 isrelatively small, a value close to the lower limit of condition (14) istaken.

Structural specifications of numerical examples are shown in Table 19.In this example, an image side working distance of 33.7 mm is assured,and the total glass material length along the optical path isextraordinarily shortened to 264.4 mm. Further, the largest diameter ofthe whole optical system is very short, as small as 293 mm, and also,the largest diameter of the second imaging system is as small as 130 mm,regardless that the NA is 0.6. FIG. 43 shows aberrations, with respectto the base wavelength 157 nm and a wavelength range of 2 pm. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 20

FIG. 27 is an optical path view of Example 20 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:8. The lens conjugatedistance L was 1190 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 9.56 mm to 13.65 mm. The optical system was provided by useof four mirrors and nine lenses, like Example 16.

In this example, denoted at r1–r8 are components of a first imagingsystem Gr1, and it comprises a positive lens (G1) at r1 and r2, negativelenses LN1 at r3 and r4; and r6 and r7 of the same type, a first mirrorM1 (concave surface) and a second mirror M2 (convex surface). Denoted atr9–r16 are components of a field optical system Grf, and it comprises apositive lens FL1, a first field mirror FM1 (concave surface), a secondfield mirror FM2 (convex surface), and negative lenses LF at r12 andr13; and r15 and r16 of the same type. Denoted at r17–r27 are componentsof a second imaging system Gr2, and it comprises a stop r17, fourpositive lenses and one negative lens.

In this example, since the magnification of the first imaging system Gr1is strongly enlarged, a value close to the lower limit of condition (9)is taken. This is because the magnification of the first mirror groupGM1 is positive, and because a value close to the upper limit ofcondition (13) is taken. As a result, a value close to the upper limitof condition (11) is taken, and the position of the intermediate imageproduced by the first imaging system Gr1 is far remote from the firstmirror M1. Further, since the pupil conjugate point of the first imagingsystem Gr1 is at the image plane side with respect to the first mirrorM1, a value close to the upper limit of condition (10) is taken.Additionally, with the use of the second field mirror group GFM2 whichis provided by the second field mirror FM2 (convex) and the negativelens LF, the Petzval sum is also controlled.

Structural specifications of numerical examples are shown in Table 20.In this example, an image side working distance of 36 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 315.5 mm. While the largest diameter of theoptical system as a whole is 355 mm at the field optical system, thelargest diameter of the second imaging system is as small as 177 mm,regardless that the NA is 0.6. FIG. 44 shows aberrations. From thedrawing, it is seen that aberrations are corrected satisfactorily.

EXAMPLE 21

FIG. 28 is an optical path view of Example 21 of the present invention.The design base wavelength was 157 nm of F₂ excimer laser light, the NAwas 0.6, and the projection magnification β was 1:10. The lens conjugatedistance L was 1190 mm. The optical system had an exposure region(imaging region) upon an image plane, of an arcuate shape, at the imageheight from 9.56 mm to 13.65 mm. The optical system was provided by theuse of four mirrors and nine lenses, like Example 16.

In this example, denoted at r1–r8 are components of a first imagingsystem Gr1, and it comprises a positive lens (G1) at r1 and r2, negativelenses LN1 at r3 and r4; and r6 and r7 of the same type, a first mirrorM1 (concave surface) and a second mirror M2 (convex surface which issubstantially flat). Denoted at r9–r16 are components of a field opticalsystem Gr1, and it comprises a positive lens FL1, a first field mirrorFM1 (concave surface), a second field mirror FM2 (convex surface), andnegative lenses LF at r12 and r13; and r15 and r16 of the same type.Denoted at r17–r27 are components of a second imaging system Gr2, and itcomprises a stop r17, four positive lenses and one negative lens.

In this example, the magnification of the second imaging system Gr2 hasa value close to the lower limit of condition (1). Also, the distancebetween the second and first mirrors M2 and M1 is short, and a valueclose to the lower limit of condition (6) is taken. Further, with theuse of the first mirror group GM1 being provided by the negative lensLN1 and the first mirror M1 as well as the second field mirror groupGFM2, which is provided by the second field mirror FM2 (convex) and thenegative lens LF, the Petzval sum is also controlled.

Structural specifications of numerical examples are shown in Table 21.In this example, an image side working distance of 36 mm is assured, andthe total glass material length along the optical path isextraordinarily shortened to 301.7 mm. While the largest diameter of theoptical system as a whole is 310 mm at the field optical system, thelargest diameter of the second imaging system is as small as 180 mm,regardless that the NA is 0.6. FIG. 45 shows aberrations. From thedrawing, it is seen that aberrations are corrected satisfactorily.

In Examples 5–21 described above, aspherical surfaces are used and,among the aspherical surfaces used, there are lens surfaces having aconical constant k set to zero. However, a design may be made whiletaking the conical constant k as a variable. Further, in these examples,the wavelength of an F₂ excimer laser was used as a design wavelength,and fluorite (n=1.5600) was used as the glass material for it. However,any other glass material such as fluorine-doped quartz, for example, maybe used. When a KrF or an ArF light source is used, fluorite and quartzmay be used in combination. Alternatively, only one of them may be usedand, on that occasion, since the dispersion of glass material issmaller, the correction of chromatic aberration becomes easier.

A projection optical system according to these examples may be used as aprojection optical system in a scan type projection exposure apparatusfor projecting a pattern (device pattern such as a circuit pattern) of areticle or a mask onto a substrate or a wafer in accordance with astep-and-scan procedure. A wafer is exposed to a device pattern by useof such an exposure apparatus, and then, the exposure wafer isdeveloped. Through subsequent processes such as etching, devices(semiconductor chips) are produced.

Structural specifications of numerical examples according to Examples1–21 are shown in Tables 1–21 below.

In the numerical examples, r_(i) denotes the curvature radius at thei-th lens surface, in an order from the object side, d_(i) is the i-thlens thickness or air spacing in an order from the object side, andn_(i) is the refractive index of the i-th lens glass, in an order fromthe object side, with respect to the base wavelength=157 nm.

Further, the refractive indices of the wavelength +2 pm and −2 pm withrespect to the base wavelength, are 1.5599949 and 1.5600051,respectively.

The shape of an aspherical surface can be given by the followingequation: $\begin{matrix}{X = {\frac{H^{2}/\eta}{1 + \left( {1 - {\left( {1 + k} \right) \cdot \left( {H/\eta} \right)^{2}}} \right)^{\frac{1}{2}}} + {A \cdot H^{4}} + {B \cdot H^{6}} +}} \\{{C \cdot H^{8}} + {D \cdot H^{10}} + {E \cdot H^{12}} + {F \cdot H^{14}} + {G \cdot H^{16}} + \ldots}\end{matrix}$where X is the amount of displacement from the lens vertex along theoptical axis direction, H is the distance from the optical axis, r_(i)is the curvature radius, k is the conical constant, and A, B, . . . andG are aspherical coefficients.

TABLE 1 EXAMPLE 1 FIRST OBJECT TO FIRST SURFACE DISTANCE: 83.739 mm i ridi ni  1 989.392 18.000 1.56000 M1  2 −3595.508 1.697 M2  3 236.00024.359 1.56000  4 2462.140 300.511  5 −114.548 18.000 1.56000  6−946.909 7.879  7 −185.804 −7.879  8 −946.909 −18.000 1.56000  9−114.548 −286.511 10 1428.922 324.390 11 380.000 48.405 1.56000 12−345.892 434.726 13 102.426 18.000 1.56000 14 225.926 45.944 150.0(stop) 21.343 16 2291.779 28.288 1.56000 17 −232.971 1.000 18 68.38922.403 1.56000 19 275.504 1.000 20 139.927 19.297 1.56000 21 275.2245.771 22 −963.793 27.452 1.56000 23 −228.789 1.000 24 106.934 18.0001.56000 25 −742.488 aspherical surfaces i K A B C D  2 0.000000e+000  3.268074e−008 −6.656739e−012   1.084352e−016 −1.466501e−020    40.000000e+000 −5.945159e−008   9.367805e−012 −3.675672e−0161.878106e−020  5 0.000000e+000 −1.045454e−008   9.094085e−013  4.644093e−017 6.202292e−019  7 0.000000e+000 −1.020658e−008−2.127267e−013 −2.970263e−017 1.066496e−019  9 0.000000e+000−1.045454e−008   9.094085e−013   4.644093e−017 6.202292e−019 120.000000e+000   1.276943e−008 −3.269379e−014 −1.148753e−0181.871030e−022 13 0.000000e+000 −1.177280e−007 −9.735382e−012−5.058594e−016 −7.794080e−020   16 0.000000e+000   7.415847e−008−1.533594e−011   2.908683e−015 −1.312466e−019   18 −2.765242e−001  −4.548406e−009   8.093119e−012 −1.772233e−015 −2.169524e−018   20−3.452390e+000   −1.157411e−007 −3.193404e−011 −1.695026e−0153.936837e−018 22 0.000000e+000   1.441342e−007   1.875541e−011  8.365199e−015 −6.884476e−018   24 −5.937621e−001   −2.497358e−007−8.672718e−011 −1.119851e−014 −1.058646e−017   i E F G  2  2.506755e−024 −9.840963e−029   0.000000e+000  4 −1.827522e−0247.013708e−029 0.000000e+000  5 −1.953400e−022 2.716627e−0260.000000e+000  7 −2.877088e−023 3.146892e−027 0.000000e+000  9−1.963400e−022 2.716627e−026 0.000000e+000 12 −9.175707e−0271.629370e−031 0.000000e+000 13   1.160369e−023 −1.219551e−027  0.000000e+000 16 −2.557773e−022 5.424698e−026 0.000000e+000 18  3.623462e−022 −1.873086e−025   0.000000e+000 20   2.639407e−022−5.908244e−025   0.000000e+000 22   7.408468e−021 −4.850248e−025  0.000000e+000 24   1.061653e−020 −1.104395e−023   0.000000e+000

TABLE 2 EXAMPLE 2 FIRST OBJECT TO FIRST SURFACE DISTANCE: 75.685 mm i ridi ni  1 297.627 19.775 1.56000 M1  2 −1115.696 328.484 M2  3 −160.54818.000 1.56000  4 2147.160 22.180  5 −203.139 −22.180  6 2147.160−18.000 1.56000  7 −160.548 −313.164  8 0.000 365.344  9 1040.329 38.0551.56000 10 −387.846 1.000 11 190.260 45.524 1.56000 12 634.071 120.14913 249.471 18.000 1.56000 14 127.136 325.385 15 0.0(stop) 1.000 16234.780 33.014 1.56000 17 −336.281 1.000 18 144.606 35.000 1.56000 19968.534 16.804 20 −793.316 35.000 1.56000 21 −100.000 1.000 22 88.38125.000 1.56000 23 0.000 aspherical surfaces i K A B C D  1 0.000000e+0001.372961e−008 3.473252e−013 −3.195720e−016   9.094243e−020  30.000000e+000 2.151239e−008 9.541648e−012 4.776084e−016 7.380865e−020  50.000000e+000 4.532898e−009 1.823606e−012 1.222571e−016 1.631434e−020  70.000000e+000 2.151239e−008 9.541648e−012 4.776084e−016 7.380865e−020 100.000000e+000 5.040814e−010 2.625973e−013 −1.989714e−017   9.422664e−02211 0.000000e+000 −5.072499e−009   1.389868e−013 −1.647184e−017  3.468047e−022 14 0.000000e+000 3.310157e−008 2.186614e−012 3.087404e−016−3.918557e−020   17 0.000000e+000 1.858529e−007 1.966297e−0112.828536e−015 2.203369e−019 20 0.000000e+000 −1.667572e−007  −3.379925e−011   7.374563e−015 −5.503285e−019   22 0.000000e+000−4.993819e−008   7.233187e−012 −2.042203e−015   3.653495e−020 i E F G  1−1.434764e−023 1.206555e−027 −4.210407e−032    3 −2.063590e−0234.825958e−027 −5.593776e−031    5 −8.711867e−025 2.964757e−0281.525109e−033  7 −2.063590e−023 4.825958e−027 −5.593776e−031   10−2.700833e−026 4.650686e−031 −4.262218e−036   11   3.873194e−028−2.799981e−031   4.425078e−037 14   1.130858e−023 −1.107497e−027  6.460332e−032 17   1.188890e−022 −2.552801e−026   7.612208e−030 20  1.402677e−023 2.115981e−027 −8.027962e−031   22 −2.309114e−022−5.309629e−026   5.804270e−030

TABLE 3 EXAMPLE 3 FIRST OBJECT TO FIRST SURFACE DISTANCE: 72.674 i ri dini  1 −593.057 25.376 1.56000 M1  2 −320.774 1.000 M2  3 463.082 27.6321.56000  4 −613.991 281.867  5 −109.249 18.000 1.56000  6 −961.687 9.159 7 −178.361 −9.159  8 −961.687 −18.000 1.56000  9 −109.249 −266.071 101622.171 305.230 11 −1660.654 24.024 1.56000 12 −365.238 1.000 13347.111 47.000 1.56000 14 −1881.176 410.002 15 8178.667 26.178 1.5600016 −212.848 75.049 17 0.0(stop) 15.536 18 268.041 33.816 1.56000 19−186.462 1.000 20 87.102 20.173 1.56000 21 350.675 1.000 22 156.47521.218 1.56000 23 86.116 6.639 24 168.945 20.602 1.56000 25 −165.9091.000 26 105.283 20.915 1.56000 27 −743.988 aspherical surfaces i K A BC D  2 −7.252390e+000   −4.701121e−009 −6.090134e−013 −1.267089e−017  8.029170e−022  4 0.000000e+000 −4.766887e−008   2.462294e−012−9.893034e−017   6.719603e−021  5 0.000000e+000   2.116808e−009−1.611319e−013 1.025091e−015 5.091150e−019  7 0.000000e+000−6.712584e−009 −8.093063e−013 2.887582e−017 9.870124e−020  90.000000e+000   2.116808e−009 −1.611319e−013 1.025091e−015 5.091150e−01910 0.000000e+000   7.054971e−010   2.418241e−014 1.839107e−018−7.963029e−023   12 0.000000e+000   4.707819e−009 −2.189427e−0141.973642e−018 −1.068343e−023   13 0.000000e+000   8.092928e−010−6.294695e−014 1.464461e−018 1.870403e−023 15 0.000000e+000−1.344505e−007   1.853632e−012 1.650439e−016 −1.056871e−020   185.660213e+000   2.805319e−008 −5.963359e−011 5.837059e−017 8.483480e−01920 −5.463452e−001   −1.335770e−007 −8.743479e−013 4.818362e−0152.569222e−020 22 −1.401348e+000   −4.899966e−008   2.339115e−011−1.429818e−014   −1.677957e−018   24 0.000000e+000   3.153044e−007−8.376396e−012 1.928547e−014 −5.705932e−018   26 6.648275e−001−1.189888e−007   6.781855e−012 −1.430235e−014   3.880028e−018 i E F G  2−4.085486e−025 1.924786e−029 0.000000e+000  4 −2.271393e−0251.177205e−030 0.000000e+000  5 −1.657547e−023 6.847636e−0270.000000e+000  7 −1.029026e−023 8.654760e−028 0.000000e+000  9−1.657547e−023 6.847636e−027 0.000000e+000 10   4.433871e−0282.201312e−032 0.000000e+000 12 −2.065745e−027 5.118720e−0320.000000e+000 13 −3.513181e−027 7.676071e−032 0.000000e+000 15−1.436354e−025 −9.351577e−030   0.000000e+000 18 −2.758585e−0222.006196e−026 0.000000e+000 20 −2.770624e−022 −8.035716e−026  0.000000e+000 22   1.983183e−021 −1.380364e−025   0.000000e+000 24−4.390899e−023 5.287086e−026 0.000000e+000 26   3.573891e−0212.151859e−025 0.000000e+000

TABLE 4 EXAMPLE 4 FIRST OBJECT TO FIRST SURFACE DISTANCE: 81.211 i ri dini  1 2240.555 47.000 1.56000 M1  2 −312.927 1.000 M2  3 209.677 34.6031.56000  4 −314.137 150.769  5 −819.717 −140.769  6 277.686 889.917  71806.318 19.445 1.56000  8 −583.025 1.000  9 0.0(stop) 73.850 10 197.07835.504 1.56000 11 879.977 1.000 12 126.409 28.494 1.56000 13 168.67598.900 14 121.885 21.036 1.56000 15 905.776 aspherical surfaces i K A BC D  2 0.000000e+000   3.706794e−008 −5.144019e−012 6.973326e−017−7.330968e−021    4 0.000000e+000   3.878903e−009   7.795334e−012−6.781754e−016   5.265168e−020  5 0.000000e+000   8.445174e−009  3.143938e−011 −2.614011e−014   2.098089e−017  6 0.000000e+000−2.863861e−009 −5.305438e−015 1.717130e−018 −3.511472e−023    70.000000e+000 −3.549063e−009 −1.408264e−013 1.931760e−019 5.091573e−02310 0.000000e+000 −5.841539e−009 −2.405096e−013 4.288890e−018−7.434790e−022   12 0.000000e+000 −5.913583e−009 −4.340165e−014−1.651705e−017   −1.294295e−022   14 0.000000e+000 −8.534527e−008−8.202426e−012 −7.411706e−016   −1.255475e−020   i E F G  2  7.818988e−025 −1.099803e−029   0.000000e+000  4 −3.124244e−0247.960469e−029 0.000000e+000  5 −1.054713e−020 2.300997e−0240.000000e+000  6 −1.813806e−028 5.037276e−032 0.000000e+000  7−4.316781e−027 8.877331e−032 0.000000e+000 10   2.311772e−026−5.842989e−031   0.000000e+000 12   1.623655e−026 −3.143454e−030  0.000000e+000 14 −2.566756e−024 −3.831608e−028   0.000000e+000

TABLE 5 EXAMPLE 5 i ri di ni Obj-distance = 281.857  1 −276.517 −185.013−1.0 M1  2 698.217 199.972 M2  3 507.773 48.488 1.56000 FL1  4 −238.8489.987 β = 1/6  5 253.725 25.649 1.56000 L = 1005 mm  6 544.261 258.577NA = 0.6  7 −100.183 10.000 1.56000  8 −348.125 108.113  9 −205.87710.000 1.56000 10 −302.653 9.696 11 0.0(stop) 11.356 12 388.065 23.3501.56000 13 −153.114 45.670 14 227.862 40.204 1.56000 15 −163.407 1.00416 82.650 12.336 1.56000 17 80.232 7.123 18 118.960 10.000 1.56000 1954.261 1.597 20 56.346 44.698 1.56000 21 −655.354 aspherical surfaces iK A B C D  1 1.497949e+000 5.904355e−008   4.604214e−012 −6.840591e−016−4.605410e−019    2 3.802520e+000 −2.958077e−008   −4.331805e−013−3.956055e−017 1.351662e−020  3 0.000000e+000 −1.396795e−008  −2.011294e−013   9.452577e−019 3.436796e−022  6 0.000000e+000−5.231213e−009   −3.200408e−013 −7.768341e−018 3.291916e−022  80.000000e+000 2.948640e−008 −6.137758e−012 −5.828601e−016−1.299053e−019   10 0.000000e+000 1.391954e−007 −1.481745e−011−9.656666e−016 2.464643e−020 13 0.000000e+000 9.988863e−008  1.676874e−011 −3.517423e−016 1.878125e−019 14 0.000000e+000−1.684369e−009   −1.027341e−011 −6.807870e−016 4.062904e−019 160.000000e+000 −1.178575e−007     4.129293e−012   4.790552e−0158.697392e−019 19 0.000000e+000 1.390299e−008 −3.249927e−010−4.393543e−014 1.252755e−016 20 0.000000e+000 2.089833e−007−3.169110e−010 −5.080159e−014 1.188278e−016 i E F G  1   4.455246e−022−9.166535e−026   0.000000e+000  2 −3.311509e−024 2.709386e−0280.000000e+000  3 −1.264170e−026 1.297626e−031 0.000000e+000  6  2.676252e−027 −1.441611e−031   0.000000e+000  8   1.266056e−023−2.859330e−027   0.000000e+000 10   6.808416e−024 2.160253e−0270.000000e+000 13 −1.242980e−023 4.020013e−028 0.000000e+000 14−4.999088e−023 2.234236e−027 0.000000e+000 16 −4.361816e−0226.665268e−026 0.000000e+000 19 −7.292427e−020 1.490664e−0230.000000e+000 20 −6.999891e−020 1.483259e−023 0.000000e+000

TABLE 6 EXAMPLE 6 i ri di ni Obj-distance = 50.000  1 182.669 30.7341.56000 M1  2 −503.082 207.487 −1.0 M2  3 −210.424 −187.803 FL1  4659.854 198.194 β = 1/5  5 444.311 36.819 1.56000 L = 956 mm  6 −268.96510.000 NA = 0.6  7 453.477 20.965 1.56000  8 −50557.268 242.048  940075.824 10.000 1.56000 10 139.483 106.449 11 −315.120 10.000 1.5600012 −568.730 9.619 13 0.0(stop) 12.608 14 594.545 31.653 1.56000 15−138.456 36.327 16 237.603 34.661 1.56000 17 −150.971 0.100 18 86.89517.884 1.56000 19 114.792 5.157 20 161.292 10.000 1.56000 21 48.4592.549 22 50.928 29.428 1.56000 23 −7294.344 aspherical surfaces i K A BC D  2 0.000000e+000 2.099767e−008   9.783077e−013 −1.844192e−0163.604034e−020  3 5.000000e+000 5.501181e−007   1.471305e−010  2.886973e−014 −5.770432e−017    4 −4.000000e+000   −9.108110e−009  −4.299510e−013 −1.602876e−017 3.309710e−021  5 0.000000e+000−2.136611e−008     4.694331e−013   1.022387e−017 −1.167939e−021    80.000000e+000 −9.037445e−009     3.670281e−013   2.497754e−017−1.935627e−021   10 0.000000e+000 1.834298e−007 −9.750539e−012−4.421365e−015 −1.558851e−018   12 0.000000e+000 9.777784e−008−1.873380e−012 −2.797369e−015 9.645417e−019 15 0.000000e+0008.427543e−011   1.174046e−011   5.170272e−016 −9.544492e−020   160.000000e+000 3.081549e−008 −1.715163e−011 −1.340386e−015 4.768602e−01918 0.000000e+000 −2.081579e−007   −2.247876e−011   7.527512e−0152.070479e−018 21 0.000000e+000 2.662651e−007 −3.356811e−010−5.994494e−014 9.695043e−017 22 0.000000e+000 3.826198e−007−2.597161e−010 −5.670062e−014 7.056558e−017 i E F G  2 −4.028724e−0241.813820e−028 0.000000e+000  3   2.143537e−020 −3.240090e−024  0.000000e+000  4 −7.115890e−025 4.509207e−029 0.000000e+000  5  3.965841e−026 −6.232492e−031   0.000000e+000  8   9.346277e−026−2.137993e−030   0.000000e+000 10 −7.137854e−023 −1.911788e−025  0.000000e+000 12 −2.470578e−022 3.056952e−026 0.000000e+000 15  3.589421e−023 −4.096568e−027   0.000000e+000 16 −4.768922e−0231.934145e−027 0.000000e+000 18 −5.194783e−022 1.217812e−0250.000000e+000 21 −1.088463e−019 3.144081e−023 0.000000e+000 22−9.170412e−020 2.592177e−023 0.000000e+000

TABLE 7 EXAMPLE 7 i ri di ni Obj-distance = 50.000  1 586.085 16.6421.56000 M1  2 −710.026 244.154 M2  3 −293.735 −213.130 −1.0 FL1  4634.175 224.502 β = 1/5  5 692.102 18.310 1.56000 L = 1199 mm  6−893.803 0.100 NA = 0.6  7 223.331 68.784 1.56000  8 726.029 73.396  9244.650 29.831 1.56000 10 754.199 319.081 11 213.429 15.000 1.56000 12104.913 106.241 13 0.0(stop) 20.000 14 712.703 86.305 1.56000 15−278.062 3.439 16 182.736 24.810 1.56000 17 −564.680 0.782 18 157.08723.136 1.56000 19 1255.657 1.227 20 87.955 50.999 1.56000 21 123.472aspherical surfaces i K A B C D  2 0.000000e+000 3.201613e−008  3.554666e−013 −3.442541e−016   8.565884e−020  3 −1.672235e+000  2.280202e−008 −7.033732e−013 3.718998e−017 −2.862300e−021    4−1.049283e+000   1.235688e−008 −1.490507e−012 7.744144e−016−3.612880e−019    6 0.000000e+000 2.918278e−008   4.292516e−0156.272355e−018 −7.663849e−022    9 0.000000e+000 1.320709e−008−8.609941e−013 1.501924e−017 −1.136497e−021   12 0.000000e+0001.980383e−007   2.532422e−011 3.138382e−015 4.147537e−019 150.000000e+000 −1.871714e−008   −6.639558e−012 2.887450e−016−2.996064e−020   16 0.000000e+000 −3.265199e−008   −6.424945e−012−9.334562e−016   5.226456e−020 18 0.000000e+000 −2.362902e−008  −2.527146e−012 1.656380e−015 2.693269e−020 21 0.000000e+0002.563403e−008 −6.361181e−011 −1.336716e−015   7.803202e−018 i E F G  2−1.071073e−023     5.207120e−028 0.000000e+000  3 1.492277e−025−2.707991e−030 0.000000e+000  4 9.419452e−023 −9.922151e−0270.000000e+000  6 4.479081e−026 −7.629337e−031 0.000000e+000  94.453112e−026 −1.452102e−030 0.000000e+000 12 2.365835e−023  1.782122e−026 0.000000e+000 15 2.959532e−024 −6.298400e−0290.000000e+000 16 3.674846e−026   1.155101e−028 0.000000e+000 18−6.493817e−024   −4.440784e−028 0.000000e+000 21 3.786297e−022−7.589609e−025 0.000000e+000

TABLE 8 EXAMPLE 8 i ri di ni Obj-distance = 50.000  1 283.541 20.4521.56000 M1  2 −1053.836 121.738 M2  3 387.920 5.000 1.56000 FL1  4229.873 124.483 β = 1/5  5 −291.995 −124.483 −1.0 L = 1198 mm  6 229.873−5.000 −1.56 NA = 0.6  7 387.920 −91.603 −1.0  8 881.192 91.603  9387.920 5.000 1.56000 10 229.873 134.534 11 1316.372 24.857 1.56000 12−643.793 0.100 13 290.336 45.391 1.56000 14 −3338.651 27.518 15 268.45538.225 1.56000 16 708.139 372.871 17 145.801 15.000 1.56000 18 87.306105.457 19 0.0(stop) 20.000 20 794.943 80.807 1.56000 21 −245.392 1.20622 219.487 25.203 1.56000 23 −440.290 0.297 24 156.783 20.641 1.56000 253004.077 0.391 26 91.029 52.047 1.56000 27 147.896 aspherical surfaces iK A B C D  2 0.000000e+000   1.670163e−008 −7.564550e−013    7.640310e−017 −8.895236e−021    4 0.000000e+000 −2.210204e−0083.615438e−012 −2.715457e−016 1.987678e−020  5 −1.612890e+000    2.100848e−008 2.048446e−013 −9.687279e−017 9.141985e−021  60.000000e+000 −2.210204e−008 3.615438e−012 −2.715457e−016 1.987678e−020 8 2.782076e+000   1.108410e−008 8.595356e−013 −4.263225e−017−8.502443e−020   10 0.000000e+000 −2.210204e−008 3.615438e−012−2.715457e−016 1.987678e−020 12 0.000000e+000   4.440282e−009−3.621140e−013     2.360928e−018 9.305637e−023 15 0.000000e+000−1.135774e−008 −4.288698e−013     6.421899e−018 −2.225858e−022   180.000000e+000   1.483922e−007 1.741862e−011   2.795320e−0153.491280e−019 21 0.000000e+000   1.354475e−008 −3.828203e−012  −1.671056e−016 3.582427e−020 22 0.000000e+000 −1.099866e−008−2.113914e−012   −4.900979e−016 4.480872e−020 24 0.000000e+000−2.754027e−008 −3.324771e−012     1.073083e−016 5.780353e−020 270.000000e+000 −2.478578e−008 1.119494e−011 −4.674713e−014 1.755113e−017i E F G  2   1.090188e−024 −5.939842e−029   0.000000e+000  4−1.063676e−024 2.691088e−030 0.000000e+000  5 −5.265028e−0251.391005e−029 0.000000e+000  6 −1.063676e−024 2.691088e−0300.000000e+000  8   2.574157e−023 −2.657189e−027   0.000000e+000 10−1.063676e−024 2.691088e−030 0.000000e+000 12 −7.574790e−0271.413732e−031 0.000000e+000 15   2.852148e−028 7.381569e−0320.000000e+000 18   8.679435e−024 1.093535e−026 0.000000e+000 21−2.719953e−024 1.131354e−028 0.000000e+000 22   2.024346e−025−8.888050e−029   0.000000e+000 24 −1.099840e−023 2.651758e−0280.000000e+000 27 −5.370134e−021 8.559204e−025 0.000000e+000

TABLE 9 EXAMPLE 9 i ri di ni Obj-distance = 51.000  1 −1815.127 22.8141.56000 LP1  2 −265.701 23.300 LN1  3 1292.112 34.549 1.56000 M1  4−329.343 239.736 LN1  5 −126.569 15.000 1.56000 LP1  6 1807.475 23.600M2  7 −187.707 −23.600 −1.0 LP1  8 1807.475 −15.000 −1.56 FL1  9−126.569 −239.736 −1.0 β = 1/5 10 −329.343 −34.549 −1.56 L = 1166 mm 111292.112 −3.300 −1.0 NA = 0.6 12 −816.892 3.300 13 1292.112 34.5491.55000 14 −329.343 292.223 15 2351.512 15.834 1.56000 16 −927.736 0.10017 304.902 27.947 1.56000 18 1478.904 10.000 19 218.515 27.908 1.5800020 527.237 169.549 21 278.804 10.000 1.56000 22 96.885 178.224 23−147.170 10.000 1.56000 24 2898.421 31.011 25 415.702 30.726 1.56000 26−182.240 9.109 27 0.0(stop) 45.578 28 190.492 37.309 1.56000 29 −267.6247.977 30 95.129 41.064 1.56000 31 116.210 15.986 32 91.034 43.2731.56000 33 −411.423 aspherical surfaces i K A B C D  2 0.000000e+0005.530494e−008 1.163655e−012 −6.282393e−017   −2.629751e−021  40.000000e+000 −1.892175e−008   4.266967e−013 1.121436e−017−3.030043e−021  5 0.000000e+000 1.663615e−007 9.890835e−012−1.309392e−015     6.427099e−019  7 9.165216e−004 2.675984e−0081.316128e−012 2.694592e−017 −3.337487e−020  9 0.000000e+0001.663615e−007 9.890835e−012 −1.309392e−015     6.427099e−019 100.000000e+000 −1.892175e−008   4.266967e−013 1.121436e−017−3.030043e−021 12 5.000000e+000 −9.389111e−009   1.539504e−0139.799722e−018 −2.247802e−021 14 0.000000e+000 −1.892175e−008  4.266967e−013 1.121436e−017 −3.030043e−021 16 0.000000e+0001.255592e−008 −3.238808e−013   5.818116e−017 −7.054083e−021 170.000000e+000 4.718829e−009 −5.145083e−013   7.657683e−017−9.189123e−021 22 0.000000e+000 −1.928999e−007   −1.154247e−011  4.702416e−017 −5.121045e−020 23 0.000000e+000 −3.035320e−007  −1.933933e−011   −2.138991e−015   −4.900557e−019 26 0.000000e+0002.223625e−008 5.913986e−012 −1.487766e−018     4.859942e−020 280.000000e+000 1.714079e−008 1.881607e−012 −6.712043e−018    5.005422e−020 31 0.000000e+000 −1.372556e−008   7.658069e−011−5.828110e−015     1.273953e−018 32 0.000000e+000 −5.643649e−007  1.451319e−011 −6.462196e−016   −8.490119e−019 i E F G  2   6.200738e−025−2.301378e−029 0.000000e+000  4   1.639180e−025 −3.981772e−0300.000000e+000  5 −2.796760e−022   4.335286e−026 0.000000e+000  7−4.892624e−024   1.494940e−027 0.000000e+000  9 −2.796760e−022  4.335286e−026 0.000000e+000 10   1.639180e−025 −3.981772e−0300.000000e+000 12   1.259049e−025 −3.392339e−030 0.000000e+000 14  1.639180e−025 −3.981772e−030 0.000000e+000 16   4.425044e−025−1.068897e−029 0.000000e+000 17   5.661917e−025 −1.358877e−0290.000000e+000 22   6.968981e−024 −1.633272e−027 0.000000e+000 23  6.415923e−023 −3.092374e−026 0.000000e+000 26 −3.316785e−024  1.932364e−028 0.000000e+000 28 −2.320660e−024   6.485526e−0290.000000e+000 31 −4.331702e−023   6.899488e−027 0.000000e+000 32  2.192732e−022 −3.846738e−026 0.000000e+000

TABLE 10 EXAMPLE 10 i ri di ni Obj-distance = 50.835  1 146.528 21.7631.56000 LP1  2 279.100 29.521 LN1  3 −775.358 24.514 1.56000 M1  4−290.509 319.654 LN1  5 −127.746 15.000 1.56000 LP1  6 901.597 15.068 M2 7 −165.915 −15.068 −1.0 LP1  8 901.697 −15.000 −1.56 FL1  9 −127.746−319.054 −1.0 β = 1/5 10 −290.509 −24.514 −1.56 L = 1160 mm 11 −775.368−2.093 −1.0 NA = 0.6 12 −1091.384 2.093 13 −775.358 24.514 1.56000 14−290.509 366.602 15 −729.668 23.975 1.56000 16 −353.616 16.059 17278.912 36.728 1.56000 18 1301.137 10.000 19 230.845 40.089 1.56000 20858.078 145.157 21 −1139.792 10.000 1.56000 22 209.297 153.635 23141.077 10.000 1.56000 24 77.386 30.123 25 291.198 29.071 1.56000 26−210.751 4.057 27 0.0(stop) 21.331 28 204.073 51.876 1.56000 29 −109.3760.559 30 220.520 23.237 1.56000 31 552.592 4.737 32 63.753 26.6441.56000 33 −13602.898 aspherical surfaces i K A B C D  2 0.000000e+000  8.655896e−008 −1.231783e−012     1.505671e−016 −1.994862e−020    40.000000e+000 −2.107372e−008 5.599304e−013 −3.486775e−017 4.285967e−021 5 0.000000e+000   1.483901e−007 −9.642930e−012   −1.428407e−016−3.220462e−019    7 −1.883904e−001     3.492160e−008 2.674541e−013−1.521679e−017 −4.134260e−020    9 0.000000e+000   1.481901e−007−9.642930e−012   −1.428407e−016 −3.220462e−019   10 0.000000e+000−2.107372e−008 5.599304e−013 −3.486775e−017 4.285967e−021 12−3.641713e+000   −1.337813e−008 6.093453e−013 −2.932265e−0173.056970e−021 14 0.000000e+000 −2.107372e−008 5.593304e−013−3.486775e−017 4.285967e−021 16 0.000000e+000 −1.271307e−0081.326186e−012 −6.548673e−017 2.762947e−021 19 0.000000e+000−2.542101e−008 1.512560e−012 −8.198475e−017 3.416616e−021 220.000000e+000 −1.103975e−007 6.579457e−012 −1.251416e−016−1.137648e−020   23 0.000000e+000 −6.584060e−007 −9.731531e−011  −4.923089e−015 −1.676955e−018   26 0.000000e+000 −2.178389e−007−1.364187e−011     1.018419e−014 −1.147459e−018   28 0.000000e+000−1.274240e−007 −1.607152e−011     8.050135e−015 −1.032749e−018   310.000000e+000   6.891976e−008 3.356366e−012   3.785313e−0163.015742e−018 32 0.000000e+000 −1.469212e−007 −7.704012e−012  −3.664705e−015 3.444260e−018 i E F G  2 2.274640e−024 −9.987248e−029  0.000000e+000  4 −2.059611e−025   2.643547e−031 0.000000e+000  56.834179e−023 −3.369361e−027   0.000000e+000  7 4.884293e−024−2.923001e−028   0.000000e+000  9 6.834179e−023 −3.369361e−027  0.000000e+000 10 −2.059611e−025   2.643547e−031 0.000000e+000 12−1.866907e−025   2.516890e−030 0.000000e+000 14 −2.059611e−025  2.843547e−031 0.000000e+000 16 −7.218715e−026   8.926086e−0310.000000e+000 19 −9.166937e−026   1.136094e−030 0.000000e+000 223.478710e−024 −1.372775e−028   0.000000e+000 23 1.557766e−021−4.766741e−025   0.000000e+000 26 1.658131e−022 9.278465e−0270.000000e+000 28 9.644428e−023 −4.735347e−027   0.000000e+000 31−7.985615e−022   1.332556e−025 0.000000e+000 32 −5.454904e−022  −8.938622e−026   0.000000e+000

TABLE 11 EXAMPLE 11 i ri di ni Obj-distance = 50.962  1 549.485 18.2251.56000 LN1  2 −348.358 404.377 M1  3 −117.591 16.000 1.56000 LN1  4−11246.509 21.694 LP1  5 −181.192 −21.694 −1.0 M2  6 −11246.509 −15.000−1.56 LP1  7 −117.591 −352.697 −1.0 FL1  8 −2026.523 −18.862 −1.56 β =1/4  9 461.050 −4.621 −1.0 L = 1430 mm 10 −376.405 4.621 NA = 0.6 11461.050 18.862 1.56000 12 −2026.523 398.890 13 1172.423 42.790 1.5600014 −501.353 0.404 15 315.855 47.177 1.56000 16 1252.990 3.907 17 200.94727.200 1.56000 18 240.640 296.917 19 −192.453 10.000 1.56000 20 602.106179.501 21 −186.356 10.000 1.56000 22 438.885 32.245 23 541.516 30.0561.56000 24 −149.805 6.704 25 0.0(stop) 45.181 26 179.275 33.860 1.5600027 −370.567 9.275 28 94.992 43.811 1.56000 29 81.799 18.120 30 58.31441.095 1.56000 31 −681.697 aspherical surfaces i K A B C D  10.000000e+000   4.575380e−008   7.817822e−013 −5.883907e−016  1.371733e−019  3 0.000000e+000   1.832675e−008 −2.154592e−013−1.520651e−016 −8.218511e−021  5 8.415167e−001   1.155130e−008  1.103292e−013 −1.409211e−017 −1.720226e−021  7 0.000000e+000  1.832675e−008 −2.154592e−013 −1.520651e−018 −8.218511e−021  80.000000e+000   2.539857e−009   6.897518e−013 −2.706670e−016  2.977375e−020 10 6.525900e−001 −3.453255e−010   6.892838e−013−1.705759e−016   1.444644e−020 12 0.000000e+000   2.539857e−009  6.897518e−013 −2.708870e−016   2.977375e−020 14 0.000000e+000−2.178001e−009   4.103517e−013 −1.817801e−017   5.715837e−022 150.000000e+000   4.463480e−009   3.163776e−014   7.085203e−019  0.000000e+000 17 0.000000e+000 −1.282492e−008   3.641378e−013−2.566752e−017   6.095086e−022 20 0.000000e+000   2.891714e−008  3.794681e−012   1.766293e−016 −1.533138e−020 21 0.000000e+000−2.046926e−007   8.688717e−012   4.769864e−016 −8.554569e−020 240.000000e+000   1.946135e−008   5.791056e−012 −3.912959e−016  4.417233e−020 26 0.000000e+000   2.141413e−009 −8.073433e−013−6.990201e−016   6.444734e−020 29 0.000000e+000 −2.143697e−008  3.327692e−011 −5.094587e−015   1.783172e−018 30 0.000000e+000−2.020052e−007 −8.522637e−012 −7.090867e−015   1.840499e−018 i E F G  1−1.760415e−023   8.840230e−028 0.000000e+000  3   6.179683e−025  8.769913e−028 0.000000e+000  5 −5.814168e−026   4.284447e−0290.000000e+000  7   6.179683e−025   8.769913e−028 0.000000e+000  8−1.502713e−024   2.475219e−029 0.000000e+000 10 −1.403417e−025−3.422820e−029 0.000000e+000 12 −1.502713e−024   2.475219e−0290.000000e+000 14 −1.027112e−026   8.042716e−032 0.000000e+000 15  3.066558e−028   0.000000e+000 0.000000e+000 17 −8.993226e−027−1.018383e−031 0.000000e+000 20   6.283744e−024 −5.389611e−0280.000000e+000 21   5.836557e−024 −1.386454e−027 0.000000e+000 24−3.359010e−024   9.801933e−029 0.000000e+000 26 −3.453019e−024  7.077619e−029 0.000000e+000 29 −4.057529e−022   2.496099e−0260.000000e+000 30 −1.434596e−021 −8.941485e−027 0.000000e+000

TABLE 12 EXAMPLE 12 i ri di ni Obj-distance = 63.346  1 973.794 19.0061.56000 LN1  2 −274.730 408.564 M1  3 −117.937 15.000 1.56000 LN1  4−21944.448 22.129 LP1  5 −183.531 −22.129 −1.0 M2  6 −21944.448 −15.000−1.56 LP1  7 −117.937 −391.508 −1.0 FL1  8 −2342.325 −16.507 −1.56 β =1/4  9 447.067 −0.506 −1.0 L = 1430 mm 10 −376.377 0.506 NA = 0.6 11447.067 16.507 1.56000 12 −2342.325 373.416 13 1097.080 47.121 1.5600014 −515.510 27.362 15 280.430 47.913 1.56000 16 718.618 7.108 17 198.34927.611 1.56000 18 249.428 300.922 19 −216.473 10.000 1.56000 20 445.322181.217 21 −171.590 10.000 1.56000 22 666.307 32.257 23 625.617 30.4221.56000 24 −151.533 8.609 25 0.0(stop) 47.280 26 180.626 36.149 1.5600027 −335.594 9.318 28 100.005 44.237 1.56000 29 88.936 17.909 30 70.80541.541 1.56000 31 −1049.267 aspherical surfaces i K A B C D  10.000000e+000   4.255133e−008   1.395979e−013 −1.009633e−016  4.472929e−021  3 0.000000e+000   1.715982e−008   1.867849e−013  1.918570e−017 −5.826782e−020  5 8.550872e−001   1.081079e−008  1.551602e−013   7.022939e−018 −6.098034e−021  7 0.000000e+000  1.715982e−008   1.867849e−013   1.918570e−017 −5.826782e−020  80.000000e+000   3.098651e−009   2.787833e−013 −1.677261e−016  1.684901e−020 10 9.872928e−001   1.142429e−009   4.039291e−013−8.905924e−017   4.728326e−021 12 0.000000e+000   3.098651e−009  2.787833e−013 −1.677261e−016   1.684901e−020 14 0.000000e+000−8.058628e−009   5.469068e−013 −1.863316e−017   4.646973e−022 150.000000e+000   8.819915e−010   1.397684e−013 −9.400188e−019  0.000000e+000 17 0.000000e+000 −1.822365e−008   3.451273e−013−2.486759e−017   4.418373e−022 20 0.000000e+000   3.055326e−008  4.873760e−012   2.383916e−016 −6.806035e−021 21 0.000000e+000−1.728562e−007   1.235438e−011   8.006503e−016 −6.090344e−020 240.000000e+000   3.819315e−008   6.635548e−012 −2.544128e−016  3.425391e−020 26 0.000000e+000   5.160883e−009 −9.687870e−013−5.829555e−016   5.807106e−020 29 0.000000e+000 −8.273895e−009  2.604783e−011 −4.590743e−015   2.375151e−018 30 0.000000e+000−1.430127e−007 −8.553894e−012 −7.235770e−015   4.163768e−018 i E F G  1  1.933908e−024 −3.573554e−028 0.000000e+000  3   9.440074e−024  1.973849e−028 0.000000e+000  5   4.929424e−025   1.438389e−0290.000000e+000  7   9.440074e−024   1.973849e−028 0.000000e+000  8−7.086691e−025   6.530829e−030 0.000000e+000 10   2.776075e−025−3.188109e−029 0.000000e+000 12 −7.086691e−025   6.530829e−0300.000000e+000 14 −6.797904e−027   4.401325e−032 0.000000e+000 15  1.176176e−027   0.000000e+000 0.000000e+000 17 −5.160404e−027−1.986704e−031 0.000000e+000 20   7.977247e−024 −8.335599e−0280.000000e+000 21 −4.004980e−024 −5.894950e−028 0.000000e+000 24−2.492308e−024   4.150762e−029 0.000000e+000 26 −3.458190e−024  9.835304e−029 0.000000e+000 29 −7.369796e−022   6.477749e−0260.000000e+000 30 −2.463212e−021   2.053279e−025 0.000000e+000

TABLE 13 EXAMPLE 13 i ri di ni Obj-distance = 385.595  1 −459.459−335.573 −1.0 M1  2 3067.293 748.381 M2  3 −739.933 −391.713 −1.0 FM1  4−573.829 392.713 FM2  5 0.0(stop) 60.000 β = 1/5  6 −130.197 54.2131.56000 L = 1100 mm  7 −119.178 0.100 NA = 0.6  8 117.405 51.990 1.56000 9 519.563 6.291 10 78.099 41.649 1.56000 11 1057.227 0.100 12 1050.17515.000 1.56000 13 87.469 11.904 14 326.920 29.310 1.56000 15−1292068.739 aspherical surfaces i K A B C D  1   2.151232e+000  2.074850e−008   1.028497e−012   1.000198e−016 −1.543777e−020  2  1.565028e+000 −1.030439e−008 −8.656324e−014   1.017720e−017−3.830427e−021  3 −1.579007e−001 −1.873321e−010 −2.793967e−016−3.564540e−021   7.688159e−026  4 −1.552277e+000 −9.150769e−009−8.581363e−014 −1.464695e−017   2.978012e−021  7   0.000000e+000−1.113320e−008   6.313114e−012 −4.925043e−016   6.437342e−020  8  0.000000e+000   5.404994e−009 −2.805582e−012   1.463407e−016−4.789462e−020 10   0.000000e+000 −1.606239e−007   1.691804e−012−2.762745e−015   1.781576e−019 13   0.000000e+000   2.498212e−007  1.350239e−011   2.359108e−014   5.612084e−019 14   0.000000e+000  4.979099e−007 −1.344689e−010   4.588479e−014 −2.537504e−017 i E F G  1  3.311515e−024 −2.995664e−028 0.000000e+000  2   5.161873e−025−2.729459e−029 0.000000e+000  3 −1.127394e−030   7.746168e−0360.000000e+000  4 −3.412103e−025   1.755156e−029 0.000000e+000  7−4.171136e−024   1.891343e−028 0.000000e+000  8   4.264568e−024−3.356973e−028 0.000000e+000 10 −4.525225e−023 −2.846830e−0280.000000e+000 13 −2.105753e−021   1.040548e−024 0.000000e+000 14  7.650574e−021 −1.459197e−024 0.000000e+000

TABLE 14 EXAMPLE 14 i ri di ni Obj-distance = 397.959  1 −447.799−347.959 −1.0 M1  2 11489.229 811.432 M2  3 −804.784 −422.009 −1.0 FM1 4 −1121.103 −15.000 −1.56 LF  5 −431.869 −5.561 −1.0 FM2  6 −1235.2365.561 LF  7 −431.869 15.000 1.56000 β = /5  8 −1121.103 423.009 L = 1100mm  9 0.0(stop) 56.691 NA = 0.6 10 −128.913 19.560 1.56000 11 −108.2720.309 12 124.318 28.713 1.56000 13 694.622 0.100 14 78.512 42.8191.56000 15 219.566 9.184 16 −741.750 15.000 1.56000 17 92.545 14.848 1873.579 20.344 1.56000 19 −2120.514 aspherical surfaces i K A B C D  1  1.651069e+000   2.374926e−008   1.702835e−012   1.390779e−017  2.614732e−020  2 −4.000000e+000 −1.043013e−008 −1.517620e−013  4.986190e−018 −2.371680e−021  3 −7.638388e−002 −1.823532e−010−2.150504e−016 −1.108786e−021   1.340316e−026  6 −3.827967e+000−8.674101e−009 −1.051516e−013 −5.752138e−018   6.145431e−022 11  0.000000e+000   4.892931e−008 −5.416482e−013   5.381903e−016  1.678633e−020 12   0.000000e+000   7.048042e−008   2.284679e−012−9.626527e−016   3.338522e−019 14   0.000000e+000 −3.924140e−008−8.582640e−012   1.843538e−015 −3.326077e−019 17   0.000000e+000  8.970756e−007   3.402220e−011   3.720934e−014   1.395150e−017 18  0.000000e+000   7.110875e−007 −5.771239e−011   5.210874e−014−9.240921e−018 i E F G  1 −7.722632e−024   7.560718e−028 0.000000e+000 2   2.760856e−025 −1.354385e−029 0.000000e+000  3 −1.379314e−031  5.943291e−037 0.000000e+000  6 −5.871993e−026   2.213211e−0300.000000e+000 11 −6.073286e−024   6.405299e−028 0.000000e+000 12−4.157626e−023   2.508234e−027 0.000000e+000 14   2.612172e−024  2.192107e−027 0.000000e+000 17 −5.673999e−021   3.032464e−0240.000000e+000 18   6.249971e−021   9.050086e−031 0.000000e+000

TABLE 15 EXAMPLE 15 i ri di ni Obj-distance = 50.000  1 204.213 15.8331.56000 LN1  2 3825.784 413.292 M1  3 −106.572 15.000 1.56000 LN1  4−857.552 17.304 M2  5 −187.562 −17.304 −1.0 FM1  6 −857.552 −15.000−1.56 LF  7 −106.572 −408.626 −1.0 FM2  8 −1909.161 951.629 LF  9−858.848 −459.710 −1.0 β = 1/4 10 −214.544 −26.074 −1.56 L = 1190 mm 11−423.622 −4.701 −1.0 NA = 0.6 12 −291.919 4.701 13 −423.622 26.0741.56000 14 −214.544 400.010 15 0.0(stop) 59.759 16 424.663 15.0051.56000 17 −637.707 0.101 18 135.307 20.950 1.56000 19 482.071 0.101 2086.180 31.425 1.56000 21 180.516 9.606 22 108.812 15.000 1.56000 2355.211 16.293 24 82.713 23.334 1.56000 25 −343.416 aspherical surfaces iK A B C D  1   0.000000e+000   7.845851e−008   3.480979e−012−2.192632e−016   2.652275e−020  2   0.000000e+000   1.287363e−007  5.213100e−012 −3.909292e−016 −2.757054e−020  3   0.000000e+000  5.511695e−008   2.742398e−012   2.976607e−016 −8.135784e−020  5  9.757356e−001   2.245223e−008   4.961650e−013   4.876359e−017−9.218124e−021  7   0.000000e+000   5.511695e−008   2.742398e−012  2.976607e−016 −8.135784e−020  8 −2.324211e−001 −3.741519e−009−2.965745e−014   3.165593e−019 −1.721869e−022  9 −1.351560e−001−4.438792e−012   4.120307e−018   6.561688e−023   1.639361e−026 10  0.000000e+000   1.134555e−008 −5.474633e−013 −1.044929e−016  1.349222e−020 12   2.922694e+000   2.325940e−008 −2.396438e−013−1.043028e−016   2.382476e−020 14   0.000000e+000   1.134555e−008−5.474633e−013 −1.044929e−016   1.349222e−020 16   0.000000e+000−5.994350e−008 −4.756412e−012 −8.685536e−017 −1.026534e−019 18  0.000000e+000 −8.290830e−008 −4.984870e−012   1.936271e−015  8.131779e−021 20   0.000000e+000   4.860989e−008   1.213638e−011−2.550341e−015   9.673512e−020 23   0.000000e+000 −4.300839e−007−3.408055e−011 −3.710689e−015 −2.158579e−018 24   0.000000e+000−3.101203e−007 −4.766363e−011   1.545142e−015   1.795645e−020 i E F G  1−1.461145e−023   1.281999e−027 0.000000e+000  2   0.000000e+000  0.000000e+000 0.000000e+000  3   3.995845e−023 −2.211509e−0270.000000e+000  5   3.224225e−024 −1.287665e−028 0.000000e+000  7  3.995845e−023 −2.211509e−027 0.000000e+000  8   1.248827e−026−4.508298e−032 0.000000e+000  9 −3.247603e−031   1.929812e−0360.000000e+000 10 −5.294016e−025 −6.522725e−030 0.000000e+000 12−1.683354e−024   3.413090e−029 0.000000e+000 14 −5.294016e−025−6.522725e−030 0.000000e+000 16   2.849939e−023 −2.173374e−0270.000000e+000 18 −3.631059e−023   2.226964e−027 0.000000e+000 20−3.275165e−023   5.637523e−027 0.000000e+000 23 −3.457497e−021  4.909090e−025 0.000000e+000 24 −1.908395e−021   8.087019e−0250.000000e+000

TABLE 16 EXAMPLE 16 i ri di ni Obj-distance = 50.267  1 282.936 21.2551.56000 LN1  2 3684.211 449.103 M1  3 −267.457 15.000 1.56000 LN1  4−1371.221 5.446 M2  5 −321.384 −5.446 −1.0 FL1  6 −1371.221 −15.000−1.56 FM1  7 −267.457 −338.525 −1.0 LF  8 −1540.132 368.971 FM2  9440.699 35.890 1.56000 LF 10 −1887.670 362.966 β = 1/5 11 −922.802−332.666 −1.0 L = 1190 mm 12 8422.125 −15.000 −1.56 NA = 0.6 13 −462.452−5.300 −1.0 14 −1026.228 5.270 15 −462.452 15.000 1.56000 16 8422.125268.193 17 0.0(stop) 64.503 18 237.890 23.809 1.56000 19 2990.697 12.03820 135.928 34.579 1.56000 21 622.051 3.846 22 144.391 38.185 1.56000 23205.170 2.454 24 114.728 15.000 1.56000 25 72.687 9.881 26 78.971 64.1131.56000 27 2179.982 aspherical surfaces i K A B C D  1   0.000000e+000  4.950479e−008 −1.556107e−012   1.719144e−017   2.105431e−021  3  0.000000e+000 −5.113917e−009 −2.873876e−012   2.602766e−017  6.788996e−020  5   7.999895e−001 −1.716298e−009 −1.163867e−012  2.214635e−018   2.170496e−020  7   0.000000e+000 −5.113917e−009−2.873876e−012   2.602766e−017   6.788996e−020  8   5.000000e+000  3.994191e−009 −6.866541e−014 −1.799842e−018 −3.213142e−023  9  0.000000e+000 −4.745677e−009   9.727308e−015 −1.323010e−019  1.552321e−024 11 −3.742879e−001 −9.987061e−011 −8.267759e−016  2.319422e−020 −3.735582e−026 12   0.000000e+000   1.256240e−008  2.224328e−012 −1.743188e−015   1.674418e−019 14   3.922730e+000−2.955486e−008 −3.015675e−013 −1.303534e−015   8.709164e−020 16  0.000000e+000   1.256240e−008   2.224328e−012 −1.743188e−015  1.674418e−019 20   0.000000e+000 −4.228533e−008 −1.756337e−012−1.341137e−016 −8.216530e−021 22   0.000000e+000   1.397442e−008−6.652675e−013   1.180182e−016   1.951605e−020 25   0.000000e+000  4.243718e−008   1.008140e−011 −5.060486e−016 −5.298502e−020 26  0.000000e+000 −1.152710e−007   4.633120e−012 −7.184290e−016−1.928268e−019 i E F G  1 0.000000e+000 0.000000e+000 0.000000e+000  30.000000e+000 0.000000e+000 0.000000e+000  5 0.000000e+000 0.000000e+0000.000000e+000  7 0.000000e+000 0.000000e+000 0.000000e+000  80.000000e+000 0.000000e+000 0.000000e+000  9 0.000000e+000 0.000000e+0000.000000e+000 11 0.000000e+000 0.000000e+000 0.000000e+000 120.000000e+000 0.000000e+000 0.000000e+000 14 0.000000e+000 0.000000e+0000.000000e+000 16 0.000000e+000 0.000000e+000 0.000000e+000 200.000000e+000 0.000000e+000 0.000000e+000 22 0.000000e+000 0.000000e+0000.000000e+000 25 0.000000e+000 0.000000e+000 0.000000e+000 260.000000e+000 0.000000e+000 0.000000e+000

TABLE 17 EXAMPLE 17 i ri di ni Obj-distance = 64.302  1 145.868 15.6541.56000 LN1  2 277.033 421.902 M1  3 −331.764 15.000 1.56000 LN1  4427.187 37.533 M2  5 −243.163 −37.533 −1.0 FL1  6 427.187 −15.000 −1.56FM1  7 −331.764 −400.174 −1.0 LF  8 −1050.590 462.707 FM2  9 1082.33545.592 1.56000 LF 10 −506.181 419.093 β = 1/4 11 −556.173 −340.231 −1.0L = 1188 mm 12 890.632 −49.792 −1.56 NA = 0.6 13 129.563 −12.279 −1.0 14503.066 12.279 15 129.563 49.792 1.56000 16 890.632 308.936 17 0.0(stop)34.831 18 212.603 15.000 1.56000 19 358.696 0.100 20 154.082 17.8671.56000 21 14558.550 0.107 22 233.915 24.251 1.56000 23 −182.460 0.24624 102.219 15.000 1.56000 25 70.401 6.731 26 78.313 40.387 1.56000 27−274.349 aspherical surfaces i K A B C D  1   0.000000e+000−4.543384e−008   2.008795e−013 −5.987597e−017 −7.178408e−022  3  0.000000e+000 −1.396774e−008 −1.312696e−012 −4.099589e−017−1.204130e−021  5   2.136452e+000   7.442417e−009   1.306120e−013  2.191394e−018 −3.414108e−023  7   0.000000e+000 −1.396774e−008−1.312696e−012 −4.099589e−017 −1.204130e−021  8   3.674765e−001−5.080134e−009 −2.169803e−013 −7.383666e−018 −2.178985e−022  9  0.000000e+000 −3.096618e−009   6.122886e−015 −3.324130e−020−2.496687e−026 11 −6.480972e−001   7.109927e−010 −3.912529e−015  3.016030e−021 −2.009020e−027 13   0.000000e+000 −1.535424e−008−4.271143e−013 −5.423533e−017   2.156146e−021 14 −2.947254e−001  1.369848e−009 −1.353039e−013   1.572367e−017 −1.209804e−021 15  0.000000e+000 −1.535424e−008 −4.271143e−013 −5.423533e−017  2.156146e−021 20   0.000000e+000 −1.254255e−007 −3.689620e−012−1.110656e−015   1.994369e−019 22   0.000000e+000 −1.374196e−007−1.437806e−011   3.602627e−015 −3.618777e−019 25   0.000000e+000  8.431891e−008 −2.787295e−011 −9.578735e−015 −5.255927e−018 26  0.000000e+000   7.697163e−008   1.013236e−011 −6.851146e−015−4.256775e−018 i E F G  1 0.000000e+000 0.000000e+000 0.000000e+000  30.000000e+000 0.000000e+000 0.000000e+000  5 0.000000e+000 0.000000e+0000.000000e+000  7 0.000000e+000 0.000000e+000 0.000000e+000  80.000000e+000 0.000000e+000 0.000000e+000  9 0.000000e+000 0.000000e+0000.000000e+000 11 0.000000e+000 0.000000e+000 0.000000e+000 130.000000e+000 0.000000e+000 0.000000e+000 14 0.000000e+000 0.000000e+0000.000000e+000 15 0.000000e+000 0.000000e+000 0.000000e+000 200.000000e+000 0.000000e+000 0.000000e+000 22 0.000000e+000 0.000000e+0000.000000e+000 25 0.000000e+000 0.000000e+000 0.000000e+000 260.000000e+000 0.000000e+000 0.000000e+000

TABLE 18 EXAMPLE 18 i ri di ni Obj-distance = 51.375  1 294.105 24.4101.56000 LN1  2 −2765.072 417.053 M1  3 −116.294 15.000 1.56000 LN1  4−2872.831 20.722 M2  5 −186.216 −20.722 −1.0 FL1  6 −2872.831 −15.000−1.56 FM1  7 −116.294 −383.291 −1.0 LF  8 −1505.962 429.623 FM2  9444.041 63.934 1.56000 LF 10 −3099.408 334.815 β = 1/4 11 −948.436−300.896 −1.0 L = 1197 mm 12 −314.227 −16.435 −1.56 NA = 0.6 13 −824.068−7.484 −1.0 14 −325.089 7.484 15 −824.068 16.435 1.56000 16 −314.227301.796 17 0.0(stop) 55.267 18 654.524 17.101 1.56000 19 −493.112 0.10020 127.646 36.817 1.56000 21 9721.169 9.587 22 124.513 19.292 1.56000 23107.027 11.036 24 94.369 15.000 1.56000 25 93.351 9.999 26 115.07347.374 1.56000 27 −373.527 aspherical surfaces i K A B C D  1  0.000000e+000   3.270469e−008 −2.618357e−012   4.062834e−016−5.211535e−020  3   0.000000e+000   4.411046e−009 −5.444659e−013−4.482642e−017   1.266365e−019  5   9.780048e−001   1.163827e−008  2.616720e−013 −9.065597e−019   1.119604e−020  7   0.000000e+000  4.411046e−009 −5.444659e−013 −4.482642e−017   1.266365e−019  8−1.539537e+000   3.786900e−009 −9.453622e−014   3.248795e−018−2.012056e−022  9   0.000000e+000 −4.149266e−009   2.307771e−015−1.751852e−021 −1.213130e−024 11 −3.776756e+000 −4.342111e−010−2.394400e−015   5.496039e−020 −1.406823e−024 12   0.000000e+000−1.673853e−009 −3.281730e−012   6.683323e−016 −8.393102e−020 14−3.600157e+000 −3.076829e−008 −3.309550e−012   6.132785e−016−1.002042e−019 16   0.000000e+000 −1.673853e−009 −3.281730e−012  6.683323e−016 −8.393102e−020 19   0.000000e+000   1.130381e−008  1.048332e−012 −2.689716e−016   1.609677e−020 20   0.000000e+000−2.363339e−008 −1.791151e−012 −4.488565e−016 −3.302356e−020 22  0.000000e+000   4.460228e−009 −2.267365e−012 −2.653562e−016  2.051402e−020 25   0.000000e+000   3.016193e−007   2.151092e−011−3.603828e−016 −2.089239e−018 26   0.000000e+000   2.718387e−007  2.254954e−011 −7.855692e−016 −2.167393e−018 i E F G  1   3.766459e−024−1.147383e−028 0.000000e+000  3 −1.676440e−023   2.206450e−0270.000000e+000  5 −9.520370e−025   9.545144e−029 0.000000e+000  7−1.676440e−023   2.206450e−027 0.000000e+000  8   1.042016e−026−2.633116e−031 0.000000e+000  9   1.190683e−029 −3.996052e−0350.000000e+000 11   1.831918e−029 −9.562670e−035 0.000000e+000 12  4.958336e−024 −1.328994e−028 0.000000e+000 14   7.328052e−024−3.110175e−028 0.000000e+000 16   4.958336e−024 −1.328994e−0280.000000e+000 19 −7.303308e−025   3.915870e−029 0.000000e+000 20−6.049533e−025 −2.110230e−029 0.000000e+000 22   5.955447e−023−4.660843e−027 0.000000e+000 25   7.756637e−022 −7.997079e−0270.000000e+000 26   7.445927e−022 −4.578951e−026 0.000000e+000

TABLE 19 EXAMPLE 19 i ri di ni Obj-distance = 51.000  1 351.655 16.7541.56000 LN1  2 −8365.385 1.500 M1  3 200.954 22.369 1.56000 LN1  4591.866 247.671 M2  5 −88.814 15.000 1.56000 FL1  6 −402.056 7.000 FM1 7 −151.144 −7.000 −1.0 LF  8 −402.056 −15.000 −1.56 FM2  9 −88.814−240.671 −1.0 LF 10 1366.187 349.374 β = 1/5 11 19831.441 26.737 1.56000L = 934 mm 12 −735.739 244.705 NA = 0.6 13 −566.816 −219.048 −1.0 14−133.579 −14.510 −1.56 15 −205.618 −1.148 −1.0 16 −202.153 1.148 17−205.618 14.510 1.56000 18 −133.579 224.997 19 0.0(stop) −4.929 20−119.907 20.312 1.56000 21 −246.626 7.094 22 153.705 24.772 1.56000 23−385.679 18.913 24 97.386 43.291 1.56000 25 177.767 7.651 26 95.44231.717 1.56000 27 364.058 6.848 28 103.255 19.448 1.56000 29 −1048.656aspherical surfaces i K A B C D  1   0.000000e+000 −8.093313e−008  4.522834e−012 −2.018073e−016   2.267148e−020  3   0.000000e+000  6.511812e−008 −3.723599e−012   1.013032e−016 −2.501488e−021  5  0.000000e+000   2.476497e−008 −5.194074e−012   2.934576e−014−6.771024e−018  7 −8.634921e−002   5.766118e−008   1.400403e−011  1.171617e−014 −2.406379e−018  9   0.000000e+000   2.476497e−008−5.194074e−012   2.934576e−014 −6.771024e−018 10   3.403605e+000−2.532676e−009   4.911669e−014   1.807856e−018 −2.255506e−022 13−5.700272e−001   1.734919e−010   1.781213e−015 −7.464135e−021  1.125815e−024 14   0.000000e+000   6.268611e−009   9.790240e−013  5.096073e−017 −4.749646e−020 16 −9.969546e−001   4.762518e−009  8.200176e−013   6.576997e−018 −5.959712e−020 18   0.000000e+000  6.268611e−009   9.790240e−013   5.096073e−017 −4.749646e−020 21  0.000000e+000   7.500151e−008 −2.370496e−011 −1.965330e−015  3.913950e−019 23   0.000000e+000 −5.983025e−009   2.383340e−011−4.396313e−016 −2.197526e−019 24   0.000000e+000   4.080007e−008−9.297261e−012   1.873727e−015 −1.418320e−019 26   0.000000e+000−3.783040e−007 −1.883182e−012 −8.030466e−016 −7.057718e−019 28  0.000000e+000 −9.452418e−008 −1.957493e−011 −1.244651e−014  0.000000e+000 i E F G  1 −3.670991e−024   2.228767e−028 0.000000e+000 3   1.383272e−024 −1.154892e−028 0.000000e+000  5   4.483389e−021−9.723939e−025 0.000000e+000  7   8.068244e−022 −6.319119e−0260.000000e+000  9   4.483389e−021 −9.723939e−025 0.000000e+000 10  1.792109e−026 −6.218030e−031 0.000000e+000 13 −3.288087e−029  4.085249e−034 0.000000e+000 14   1.007847e−023   2.645246e−0290.000000e+000 16   1.769682e−023 −1.119411e−027 0.000000e+000 18  1.007847e−023   2.645246e−029 0.000000e+000 21 −1.267664e−023−8.319497e−028 0.000000e+000 23   1.954211e−023 −3.173836e−0290.000000e+000 24   1.171050e−023 −3.681475e−028 0.000000e+000 26  8.165762e−023   1.411746e−026 0.000000e+000 28 −2.398432e−022−4.378158e−025 0.000000e+000

TABLE 20 EXAMPLE 20 i ri di ni Obj-distance = 50.000  1 245.198 40.7461.56000 LN1  2 565.312 378.944 M1  3 −198.743 15.000 1.56000 LN1  4−553.813 2.806 M2  5 −383.608 −2.806 −1.0 FL1  6 −553.813 −15.000 −1.56FM1  7 −198.743 −358.732 −1.0 LF  8 6976.362 386.889 FM2  9 355.68551.490 1.56000 LF 10 −12321.788 369.283 β = 1/8 11 −1028.093 −343.512−1.0 L = 1190 mm 12 730.908 −15.000 −1.56 NA = 0.6 13 −1511.630 −0.100−1.0 14 −1023.030 0.070 15 −1511.630 15.000 1.56000 16 730.908 323.51317 0.0(stop) 39.007 18 302.719 22.983 1.56000 19 −6847.780 21.360 20145.723 31.514 1.56000 21 618.670 8.713 22 147.653 25.174 1.56000 23391.950 8.285 24 121.433 15.000 1.56000 25 80.944 14.809 26 94.82968.564 1.56000 27 −806.611 aspherical surfaces i K A B C D  10.000000e+000   2.707002e−008 −8.717359e−013   1.291774e−017−8.046083e−023  3 0.000000e+000 −1.285216e−008 −4.644289e−012−1.098284e−015   4.074896e−020  5 1.853481e+000 −5.942386e−009−1.921556e−012 −3.991601e−016   3.066166e−020  7 0.000000e+000−1.285216e−008 −4.644289e−012 −1.098284e−015   4.074896e−020  84.692105e+000   6.776075e−009 −1.213133e−013   2.083765e−018−3.379785e−023  9 0.000000e+000 −7.268271e−009   3.352308e−015−1.357278e−019 −1.824547e−024 11 1.213373e+000 −1.515625e−010−6.598956e−015   2.230167e−019 −3.018642e−024 12 0.000000e+000  2.663004e−009 −5.964634e−012 −3.132031e−015   3.139422e−019 143.818120e+000 −5.339360e−008 −6.525763e−012 −2.026068e−015  1.112273e−019 16 0.000000e+000   2.663004e−009 −5.964634e−012−3.132031e−015   3.139422e−019 20 0.000000e+000 −4.537132e−008−1.444034e−012 −6.237537e−017 −1.225622e−020 22 0.000000e+000  2.258810e−008 −2.784423e−012 −4.694218e−017   4.207858e−020 250.000000e+000   1.033200e−007 −6.071918e−012 −2.759843e−015−3.195258e−019 26 0.000000e+000 −2.135939e−008 −6.495251e−012−2.642392e−015 −2.963340e−019 i E F G  1 0.000000e+000 0.000000e+0000.000000e+000  3 0.000000e+000 0.000000e+000 0.000000e+000  50.000000e+000 0.000000e+000 0.000000e+000  7 0.000000e+000 0.000000e+0000.000000e+000  8 0.000000e+000 0.000000e+000 0.000000e+000  90.000000e+000 0.000000e+000 0.000000e+000 11 0.000000e+000 0.000000e+0000.000000e+000 12 0.000000e+000 0.000000e+000 0.000000e+000 140.000000e+000 0.000000e+000 0.000000e+000 16 0.000000e+000 0.000000e+0000.000000e+000 20 0.000000e+000 0.000000e+000 0.000000e+000 220.000000e+000 0.000000e+000 0.000000e+000 25 0.000000e+000 0.000000e+0000.000000e+000 26 0.000000e+000 0.000000e+000 0.000000e+000

TABLE 21 EXAMPLE 21 i ri di ni Obj-distance = 50.487  1 248.654 45.8791.56000 LN1  2 2498.279 433.450 M1  3 −430.357 17.451 1.56000 LN1  41258.317 2.793 M2  5 −320.814 −2.793 −1.0 FL1  6 1258.317 −17.451 −1.56FM1  7 −430.357 −170.466 −1.0 LF  8 −566426.061 200.710 FM2  9 −1563.03937.005 1.56000 LF 10 −250.953 361.172 β = 1/10 11 −765.976 −329.940 −1.0L = 1190 mm 12 244.884 −15.000 −1.56 NA = 0.6 13 549.490 −6.231 −1.0 14−701.208 6.201 15 549.490 15.000 1.56000 16 244.884 283.488 17 0.0(stop)46.600 18 244.341 23.507 1.56000 19 57346.724 0.100 20 138.156 28.7701.56000 21 561.247 3.336 22 145.732 37.036 1.56000 23 260.318 4.990 24111.587 15.000 1.56000 25 70.790 33.292 26 75.408 49.617 1.56000 275689.128 aspherical surfaces i K A B C D  1   0.000000e+000−2.521478e−009 −8.451485e−014   5.214505e−019 −2.685571e−023  3  0.000000e+000 −3.993741e−008   2.044280e−012   1.954603e−014  4.016803e−018  5   4.706536e+000 −4.082512e−008 −1.158264e−011  7.155566e−015 −2.269483e−019  7   0.000000e+000 −3.993741e−008  2.044280e−012   1.954603e−014   4.016803e−018  8   5.000000e+000−3.971095e−009 −7.223454e−014 −1.084017e−018   6.587792e−024  9  0.000000e+000 −4.759165e−009   1.313843e−014   1.109392e−019−1.230866e−024 11   3.289899e−001 −3.568080e−010 −1.380316e−015  1.016681e−020 −6.587533e−026 12   0.000000e+000 −2.613402e−008−9.198710e−013 −1.784868e−016   2.018156e−020 14 −4.000000e+000−3.882997e−008 −1.433855e−012 −1.916913e−016   4.859577e−022 16  0.000000e+000 −2.613402e−008 −9.198710e−013 −1.784868e−016  2.018156e−020 20   0.000000e+000 −4.145601e−008 −2.245516e−012−8.585230e−017 −7.216150e−021 22   0.000000e+000   1.029827e−008−4.482490e−015   1.152103e−017   1.349052e−020 25   0.000000e+000  1.056111e−007   8.819533e−012   3.490901e−016   2.003722e−020 26  0.000000e+000 −3.282437e−008   3.472717e−012 −3.391125e−016−1.465019e−019 i E F G  1 0.000000e+000 0.000000e+000 0.000000e+000  30.000000e+000 0.000000e+000 0.000000e+000  5 0.000000e+000 0.000000e+0000.000000e+000  7 0.000000e+000 0.000000e+000 0.000000e+000  80.000000e+000 0.000000e+000 0.000000e+000  9 0.000000e+000 0.000000e+0000.000000e+000 11 0.000000e+000 0.000000e+000 0.000000e+000 120.000000e+000 0.000000e+000 0.000000e+000 14 0.000000e+000 0.000000e+0000.000000e+000 16 0.000000e+000 0.000000e+000 0.000000e+000 200.000000e+000 0.000000e+000 0.000000e+000 22 0.000000e+000 0.000000e+0000.000000e+000 25 0.000000e+000 0.000000e+000 0.000000e+000 260.000000e+000 0.000000e+000 0.000000e+000

While the invention has been described with reference to the structuresdisclosed herein, it is not confined to the details set forth and thisapplication is intended to cover such modifications or changes as maycome within the purposes of the improvements or the scope of thefollowing claims.

1. A projection optical system for projecting an image of an object ontoan image plane, said projection optical system comprising: a firstimaging optical system for forming an image of the object, said firstimaging optical system including a first mirror for reflecting andcollecting abaxial light from the object; a second imaging opticalsystem for re-imaging the image upon the image plane; a second mirrorfor reflecting the abaxial light from said first mirror to the imageplane side, whereby the abaxial light is caused to pass outside of aneffective diameter of said first mirror; and a field optical systemincluding three lenses each having a positive refractive power, whereinthe abaxial light passed through the outside of the effective diameterof said first mirror is refracted by said three lenses toward adirection nearing an optical axis of said three lenses, wherein, in ameridional plane, the abaxial light passes through only one side of saidthree lenses with respect to the optical axis, wherein light that haspassed through said three lenses is directed to said second imagingoptical system, and wherein said first and second imaging opticalsystems are disposed along a common optical axis.
 2. A projectionoptical system according to claim 1, wherein said field optical systemincludes one lens having a negative refractive power.
 3. A projectionexposure apparatus for projecting a pattern of a mask onto a substratethrough a projection optical system as recited in claim
 1. 4. Aprojection exposure apparatus according to claim 3, wherein laser lightfrom one of an ArF excimer laser and an F₂ excimer laser is used for theprojection optical system.
 5. A device manufacturing method, comprisingthe steps of: printing a device pattern on a wafer by exposure, using aprojection exposure apparatus as recited in claim
 3. 6. A projectionexposure apparatus for projecting an image of an object onto an imageplane, said apparatus comprising: a first imaging optical system forforming an intermediate image of the object, said first imaging opticalsystem including (i) a first lens unit having a positive power, (ii) afirst optical unit having a first mirror for reflecting and collectingabaxial light from the object, (iii) a second optical unit having asecond mirror for reflecting light from said first mirror to the imageplane side, with which the abaxial light is caused to pass an outside ofan effective diameter of said first mirror, and (iv) a second lens unithaving a negative power and being disposed between said first and secondmirrors; a second imaging optical system for re-imaging the intermediateimage upon the image plane, said second imaging optical system beingcomposed of a plurality of lenses; and a field optical system disposedbetween said first imaging optical system and said second imagingoptical system, for projecting a pupil of said first imaging opticalsystem onto said second imaging optical system, said field opticalsystem including three lenses each having a positive power, wherein, ina meridional plane, the abaxial light passes through only one side ofsaid three lenses with respect to the optical axis, and wherein saidfirst imaging optical system, said second imaging optical system andsaid field optical system are disposed along a common straight opticalaxis.
 7. A projection exposure apparatus according to claim 6, furthercomprising a projection optical system for projecting a pattern of amask onto a substrate.
 8. A device manufacturing method, comprising thesteps of: printing a device pattern on a wafer by exposure, using aprojection exposure apparatus as recited in claim 7; and developing theexposed wafer.